Image display apparatus

ABSTRACT

An image display apparatus includes an indicating element which modulates or emits light as a pixel in accordance with image information. A displacement unit optically displaces a position of the pixel for each of two or more sub-fields constituting an image field corresponding to the image information. A projection unit enlarges the pixel and projects an enlarged pixel on a screen. A pixel-profile deformation unit changes an optical intensity profile of the pixel.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to an image display apparatus of highresolution imaging which is provided with a pixel displacement unitwhich carries out optical displacement of the pixels of the imagingelements, such as those in a spatial optical modulator or a spatiallight discharge unit, for each of two or more sub-fields of the imagefield. More specifically, the present invention relates to a projectionimage display apparatus of high resolution imaging which is applicableto a front or rear projector which projects a real image on the screen,and a head-mounted display or a view finder which projects a virtualimage on the screen.

2. Description of the Related Art

Japanese Laid-Open Patent Application No. 04-113308. (Japanese PatentNo. 293926), Japanese Laid-Open Patent Application No. 05-289044,Japanese Laid-Open Patent Application No. 09-152572, Japanese Laid-OpenPatent Application No. 06-324320, and Japanese Laid-Open PatentApplication No. 2000-98968 disclose a projection image display methodwhich is made to carry out the optical displacement of the image of thespatial optical modulator (for example, the liquid crystal unit)optically for every sub-field, and projects the image at a resolutionhigher than the resolution of the spatial optical modulator.

The conventional image display devices of the above documents can obtainthe twice (or 4 times) as many pixel, i.e., twice (or 4 times) as manyresolution as the, as the respectively on the screen by carrying outdisplacement of the pixel optically by optical-axis shift to the twolocations (or location of four every direction) perpendicular to thescanning line, and making the sub-field corresponding to thedisplacement into the two sheets or the four sheets.

Moreover, Japanese Laid-Open Patent Application No. 08-194207, JapaneseLaid-Open Patent Application No. 09-230329, and Japanese Laid-OpenPatent Application No. 09-015548 disclose an image display method whichcontrols the amount of the optical displacement of the arrangement ofthe pixels and the optical-axis shift and the displacement directionthereof. The conventional image display devices of the above documentsimprove 3 times the resolution of the modulator by making thedisplacement of the three locations carry out in the same direction, andon the other hand, putting spatially, the RGB pixels which are producedby the spatial separation with the filters.

By performing the optical displacement, the delta arrangement of RGB isrealized, or only some pixels indicated only in the specific portion aredisplaced, and the image display device which performs high-resolutionimaging is also disclosed.

Japanese Laid-Open Patent Application No. 04-113308 discloses thespatial optical modulator in which the pixel size is smaller than thepixel pitch by one half. When the high-resolution imaging is performedby using the modulator and the optical-axis shift unit, the projectionimage-forming device of high resolution imaging which does not producethe lap between the adjoining pixels is also disclosed.

However, the pixel configuration is mainly determined in the apertureconfiguration of the spatial optical modulator, and since thepermeability in the aperture is uniform, the optical intensity crosssection which the contour configuration of the pixel in the fieldcontaining the pixel is usually the square, and is the beam profile(pixel profile) has the pixel profile which has the rectangleconfiguration which has the big step with the edge of the aperture.

For the reason, the gradation of edge of the image including one or morecontinuous pixels in the spatial optical modulator turns, into a large,spatial-frequency modulation, and the “resolution” measured by theoptical intensity distribution of the line and space in the maximumspatial frequency of the pixel unit, and the “sharpness” by viewingbecome good. However, as the evaluation by viewing, the “hardness”, the“jaggies”, and the “image discontinuity” of the image becomeconspicuous. The problem corresponds to the disadvantage of the image ofthe liquid crystal over the image of CRT.

The pixel profile of CRT is the pixel profile that is similar to theGaussian distribution form, and is a smooth image in which the“hardness”, the “jaggies”, and the “image discontinuity” are notconspicuous as the visibility. The “gradation discontinuity” stopssimultaneously, being conspicuous as the results.

However, the “resolution” and the “sharpness” are not so good for thenumber of the pixels or on the basis of the number of the pixels.

On the other hand, the contour configuration of the pixel of the liquidcrystal display which is the flat panel is the rectangle, and the pixelprofile is the rectangle configuration.

For the reason, “resolution” and the “sharpness” are the images in whichthe “hardness”, the “jaggies”, and “image discontinuity” are conspicuousto being good on the basis of the number of the pixels, or the number ofthe pixels.

For the reason, even if it is monochrome character-of binary data, theprocessing which performs the high-gradation display which used grayscale about the “edge” portion, and stops being conspicuous in the“hardness”, the “jaggies”, and “image discontinuity” with the softwareprocessing to the font image may be made.

In the case of the conventional data projector of low resolution of SVGAor XGA class, the amounts of information of the one screen itself runshort from the first for low resolution.

The number of the dots which forms the one character will be in the fewstate, in the case, it may become the impression which faded when theedge is not sharp, the distinction nature of the character may getworse, the visibility may tend to deteriorate, and the “hardness” as thevisibility, the “jaggies”, “image discontinuity”, and “gradationdiscontinuity” may be conversely desirable.

However, in the low resolution about VGA, in the case of the projectorof the object for the images of the case of the projector for theimages, and the high resolution more than UXGA, and both for data, itsets.

It becomes important to consider the environment more by energy savingat the same time unlike the conventional projector for data of lowresolution the request to the image quality is becoming enough as anamount of information of the one screen, realizes “the smoothness of thefield and the edge” of the image by the high resolution on it, improvesthe visibility, improves the observer's recognition rate, reduces therate of the error and reduces fatigue of the observer.

For the reason, the multiplication effectiveness according using theoptical-axis shift unit to the one the twice of the original liquidcrystal light valve, and further 3 times the number of the scanninglines of the, and the data linear density.

For example, consideration is given to performing the 4-foldhigh-resolution imaging or the 9-fold one for the number of the pixels.When the 4-fold high-resolution imaging is performed and pixel reductionis carried out to 50% or less of the conventional rates of the linearaperture (or the usual rate of the area-aperture is 25% of the 2'spower), the pixel configuration of the projection image of projectingthe reduced pixel with the projection lens is difficult to realize the“smoothness of the field and the edge” which is demanded in the case ofthe high resolution, unlike the case of the conventional projector oflow resolution.

It is the projection lens, when the conventional pixel of the spatialoptical modulator whose optical intensity the contour configuration isthe square configuration and is the rectangle configuration is projectedand projector equipment is produced.

Although the beam profile of the rectangle configuration is changed andit becomes the pixel on the screen according to the MTF frequencycharacteristic of the projection lens at the same time the square pixelis expanded on the screen for the predetermined magnification, it ischanged so that it may have curvature with the usually big edge of theends of the rectangle configuration.

Although the resolution of the projection lens for data projectionsdiffers greatly also with the kind of the image information, and theproduct price strap, in order to usually harness the resolution of theliquid crystal light valve in high cost effectively relatively, 30% ormore is required for MTF in the highest spatial frequency which thepitch of the pixel gives, and it is 50% or more preferably.

If the projection lens is MTF 100% in all spatial frequencies at thetime, since the image in the liquid crystal light valve and theexpansion image on the screen have the relation of 1:1 completely, thepixel profile is the rectangle configuration and the “hardness” as thevisibility, the “jaggies”, and “image discontinuity” are the veryconspicuous images like the LCD monitor as a usual flat display.

Actually, since MTF of the projection lens is not completely 100% in theentire spatial frequencies, corresponding to approaching thesine-wave-pixel profile simply, image quality can receive thedeformation, and the beam profile of the rectangle configuration of thepixel can reduce the “hardness”, the “jaggies”, the “imagediscontinuity”, etc.

However, even if it projects the reduced pixel of 50% or less of theconventional rates of the linear aperture with the projection lens ofcomparatively low MTF and forms the projection image, the rate of theaperture is small, and there is the space between the adjoining pixelswhen MTF of the projection lens is dropped to the state where the“hardness”, the “jaggies”, the “image discontinuity”, etc. are notconspicuous. The resolution of the image also deterioratessimultaneously, and the “sharpness” of the image is reduced.

When MTF of the projection lens becomes still smaller than 30%, theinclination becomes still larger, improvement in the image quality whenperforming high-resolution imaging by carrying out the optical-axisshift in the case is almost lost, and it becomes impossible to displayonly the deteriorated image instead.

This is the case when the focus location of the projection lens isshifted and the focal location is removed. As the pixel profile whichhas performed pixel reduction simply by making the rate of the apertureinto 50% or less of rates of the linear aperture, the pixel profilewhich decreases the “hardness”, the “jaggies”, “image discontinuity”,etc. is unsuitable in the case of high-resolution imaging.

Japanese Laid-Open Patent Application No. 09-054554 discloses that, whencarrying out the optical-axis shift and performing high-resolutionimaging, the above-mentioned method of focusing with the focusing lenssmaller than the comparatively large aperture of the penetrated typeliquid crystal panel

FIG. 16, FIG. 17A, and FIG. 17B show an example of the conventionalimage display apparatus which combines the penetrated type micro lens tothe penetrated type liquid crystal panel as the means for changing thepixel size, which is disclosed in Japanese Laid-Open Patent ApplicationNo. 09-054554.

FIG. 16 shows the example of the micro lens which has the penetratedtype liquid crystal light-valve with the specific aperture, and thecircular contour which reduces pixel size rather than the small aperturewhich is restrained and produced by the active unit.

FIG. 17A and FIG. 17B show the state of the continuation pixel profilewhich is formed when the optical-axis shift of the pixel profile of therectangle configuration having the pixel reduced by the composition ofFIG. 16 is carried out.

In FIG. 16, reference numeral 101 is the incident-light ray, 102 is thefocusing optical system, 102 a is the minute lens, 103 is the indicatingelement, 103 a is the opening of the pixel which is provided in theindicating element 103, 101 a is the picture element which is formedwith the focused light ray, and 104 is the outgoing ray.

The incoming ray 101 which is incident to the opening 103 a of the pixelof the indicating element 103 is focused by the minute lens 102 in thefocusing optical system 102, and the focusing pixel 101 a is incident tothe opening 103 a and passes through it.

The ray which comes out from the opening 103 a after this penetrationturns into the outgoing beam 104.

FIG. 17A shows the state of the continuation pixel profile formed whenthe optical-axis shift is performed without reducing the pixel size.

FIG. 17B shows the state of the continuation pixel profile formed whenthe optical-axis shift is performed when reducing the conventional pixelshown in FIG. 16.

Both the states of FIG. 17A and FIG. 17B are shown to explain theoperation of the projection expansion apparatus using the penetratedtype liquid crystal light valve and the optical-axis shift unit whenperforming the high-resolution imaging that is the 2-fold one in onedirection.

As shown in FIG. 17A, when not carrying out pixel reduction, the pixelis slightly reduced by the aperture with the less than 100% area openingfactor determined by the arrangement of the active unit (not shown)prepared in the pixel.

Even if the pixel profile in the case is the rectangle configurationlimited by the aperture and uniform lighting high-resolution it byoptical-axis shift using such a pixel profile. While the resolution isnot improved in spite of the optical intensity of these overlappingportions having increased in step and having used the optical-axis shiftwhen the pixel profiles of the shifted rectangle configurationoverlapped, there is the problem that the “discontinuity” of the imagewill be conspicuous.

When pixel reduction is carried out, the width of face of the pixelprofile of the rectangle configuration is made into 50% or less of thepixel pitch, and the lap between the adjoining pixel profiles is lost,but the resolution is improved as shown in FIG. 17B.

However, similar to the case of Japanese Laid-Open Patent ApplicationNo. 04-113308, the pixel profile shown in FIG. 17B is the pixel profileof the rectangle configuration in which the rate of the linear apertureis 50% or less. The “sharpness” as the visibility and the “resolution”are good, but the “hardness”, the “jaggies”, and the “imagediscontinuity” are conspicuous like the LCD monitor as a usual flatdisplay.

Although the can be reduced by changing the MTF characteristics of theprojection lens, the “resolution” and the “sharpness” will deteriorateconversely.

For the reason, as the image projector of high resolution which realizeshigh-resolution imaging, or a data projector of high resolution, theprojection image which secures the “sharpness” which is demanded, unlikethe case of the conventional projector of low resolution, takingadvantage of the high resolution imaging by increase of the number ofthe pixels in the case of the high resolution imaging, and the“smoothness of the field and the edge” cannot be realized by shiftingthe pixel profile using the optical-axis shift unit.

Such a problem cannot be-resolved if the pixel profile of the projectionimage having the pixel size reduced is in the rectangle configurationeven when the contour configuration of the pixel is changed to thecircular configuration with the focusing optical system as shown in FIG.16. It is difficult to achieve the purpose of high-resolution byincrease of the number of the pixels using the optical-axis shift unit.

Furthermore, in the case of Japanese Laid-Open Patent Application No.04-113308, the pixel size is reduced, but it is materialized only on theassumption that the beam profile of the rectangle configuration forwhich pixel reduction of 50% or less of rates of the linear aperture isneeded in order for the pixel profile not to lap, and the descriptionabout the pixel profiles other than the rectangle configuration is notaccepted at all, but is produced by the pixel profile of the rectangleconfiguration.

On the other hand, in the case of Japanese Laid-Open Patent ApplicationNo. 09-054554, it is indicated that the brightness level, i.e., theoptical intensity, is improved and the contrast is improved, since theaverage luminance per 1-pixel area does not improve even if peakluminance improves, except that the rate of the effective aperture ofthe pixel by reducing the pixel improves, there cannot be no improvementin optical use efficiency.

Generally, the luminance of the case is reduced by the same or loss bythe added optic on the basis of the area of the original pixel.

Furthermore, the case of Japanese Laid-Open Patent Application No.09-054554 is premised on the rectangle configuration as a pixel profileof the reduced pixel, as shown in FIG. 17B.

For the reason, when improving and doubling the resolution in onedirection using the optical-axis shift unit, in order for the pixel bywhich the optical-axis shift is carried out not to lap like FIG. 17A, itis necessary that the pixel reduction is at least 50% or less of therate of the linear aperture.

For the reason, the F value of the reflection light ray is increasedalmost two times the F value of the incident light determined by thelighting optical system, and a very bright lens as the projection lensis required.

On the contrary, if the projection lens of the optimal F value is usedwhen not carrying out pixel reduction, the reflection of the projectionlens will arise and it will become 25–50% of very low optical useefficiency as compared with the case where pixel reduction is notcarried out.

Moreover, the case where the F value of the reflection light becomesbrighter than 2 double part by many yields of the optical system usedfor pixel reduction arises.

Under the influence, the F value (it is the ½ twice as many projectionlens as the at the F value) of the brightness of 2 twice is used at theangle of the outgoing beam, but the optical use efficiency willdecrease. For the reason, when carrying out pixel reduction, theimprovement in optical use efficiency is a very important problem.However, there is no teaching in Japanese Laid-Open Patent ApplicationNo. 09–054554 as to how to solve the above-mentioned problem.

SUMMARY OF THE INVENTION

An object of the present invention is to provide an improved imagedisplay apparatus in which the above-described problems are eliminated.

Another object of the present invention is to provide an image displayapparatus in which the optical-axis shift unit is used to increase thenumber of pixels and aim at the high resolution imaging, which securesthe resolution and the sharpness of the projection image and realizesthe smoothness of the field and edge by reducing the hardness, thejaggies and the image discontinuity as in the conventional image displayapparatus.

Another object of the present invention is to provide an image displayapparatus in which the optical-axis shift unit is used to increase thenumber of pixels and aim at the high resolution imaging, whicheffectively increases the efficiency of use of the light.

The above-mentioned objects of the present invention are achieved by aprojection image display apparatus comprising: an indicating elementwhich modulates or emits light as a pixel in accordance with imageinformation; a displacement unit which optically displaces a position ofthe pixel for each of two or more sub-fields constituting an image fieldcorresponding to the image information; a projection unit which enlargesthe pixel and projects an enlarged pixel on a screen; and apixel-profile deformation unit which deforms an optical intensityprofile of the pixel.

The above-mentioned objects of the present invention are achieved by animage display apparatus comprising: a light source which emits light; anirradiation optical element which converts the light from the lightsource into an irradiation beam; a plurality of optical modulatorsarranged on a flat surface, the plurality of optical modulatorsoptically modulating the irradiation beam incident to the opticalmodulators, and each optical modulator reflecting the irradiation beamto output a reflected beam; a light-path modulation unit modulating alight path of the reflected beam from the plurality of opticalmodulators in space coordinates; and a reflection-type beam profiledeformation unit, provided in each of the plurality of opticalmodulators, which deforms a beam profile of the reflected beam outputfrom each optical modulator.

According to the present invention, the relative optical intensity nearthe edge of the pixel can be decreased according to the pixel profile ofthe non-rectangle configuration, the influence of the lap between thecontiguity pixels when carrying out the optical-axis shift is reduced,and it is possible to provide an image display apparatus which realizesthe “sharpness” of the image and the “smoothness of the field and theedge” simultaneously.

Moreover, the angle of the outgoing light ray can be reduced byincreasing the relative value to the pixel pitch for the full width athalf maximum of the pixel profile, and the reflection of the outgoinglight ray can be reduced with the projection lens. Therefore, it ispossible to realize the image display apparatus which effectivelyincreases the efficiency of use of the light.

In the image display apparatus of the present invention, securing the“resolution” and the “sharpness” is possible, and reducing the“hardness”, the “jaggies”, and the “image discontinuity” is possible.Thus, the “smoothness of the field and the edge” is realized and,according to the present invention, the bright projection image displayapparatus which effectively increases the efficiency of use of thelight.

BRIEF DESCRIPTION OF THE DRAWINGS

Other objects, features and advantages of the present invention will beapparent from the following detailed description when read inconjunction with the accompanying drawings.

FIG. 1 is a diagram showing the projection image display apparatusaccording to one embodiment of the present invention.

FIG. 2 is a diagram showing an example of the pixel reduction unit inthe projection image display apparatus of FIG. 1.

FIG. 3 is a diagram for explaining the characteristics of an example ofthe projection pixel profile of the non-rectangle configuration.

FIG. 4 is a diagram showing a pixel-profile deformation unit of oneembodiment of the present invention.

FIG. 5A, FIG. 5B, and FIG. 5C are diagrams showing the evaluationresults of one embodiment of the present invention and some comparativeexamples.

FIG. 6A and FIG. 6B are diagrams for explaining the half-width and theCTF according to the present invention.

FIG. 7 is a drawing for explaining the definition of the CTF accordingto the present invention.

FIG. 8A and FIG. 8B are diagrams for explaining the definition of theCTF at the time of using the pixel-profile deformation unit and theoptical-axis shift unit.

FIG. 9A and FIG. 9B are diagrams showing an example of the projectionimage for explaining the item of the subjectivity evaluation to theimage quality of a projection image.

FIG. 10 is a diagram for explaining the characteristics of an example ofthe pixel profile according to one embodiment of the present invention.

FIG. 11 is a diagram showing the results of calculation of the profileon the screen.

FIG. 12A, FIG. 12B, and FIG. 12C are diagrams showing examples of theprojection image for explaining the item of the subjectivity evaluationto the image quality of the projection image.

FIG. 13 is a diagram showing an example of the pixel-profile deformationunit of the embodiment 11 of the present invention.

FIG. 14 is a diagram showing an example of the pixel-profile deformationunit according to one embodiment of the present invention.

FIG. 15 is a diagram showing an example of a spatial optical modulatoraccording to one embodiment of the present invention.

FIG. 16 is a perspective view of an example of a conventional projectionimage display apparatus.

FIG. 17A and FIG. 17B are diagrams for explaining the operation of theprojection image display apparatus of FIG. 16.

FIG. 18 is a cross-sectional view of a reflection-type light valveaccording to one embodiment of the image display apparatus of thepresent invention.

FIG. 19 is a diagram for explaining operation of the reflection-typelight valve of FIG. 18.

FIG. 20 is a diagram for explaining a relation between the maximum angleat the time of incidence to the pixel and the maximum angle at the timeof reflection.

FIG. 21 is a diagram for explaining the operation which changes thepixel profile output by the reflection-type light valve, and increasesthe number of the pixels.

FIG. 22A through FIG. 22G are diagrams for explaining the operationwhich projects on the screen the reduced pixel which is reflected fromthe reflective concave mirror by the reflection-type light valve.

FIG. 23 is a diagram for explaining an example of a high precisionprojector according to one embodiment of the present invention.

FIG. 24A and FIG. 24B are diagrams for explaining the definition of theCTF according to the present invention.

FIG. 25 is a diagram showing the evaluation value of the pixel reductionat the time of changing the index of refraction of the embedding layer.

FIG. 26 is a diagram showing the rate of reduction which is theevaluation value of the pixel reduction when changing the curvature of aconcave mirror.

FIG. 27 is a diagram showing the CTF which is the evaluation value ofthe pixel reduction when changing the curvature of a concave mirror.

FIG. 28 is a diagram showing one embodiment of the present inventionwhen the micro lens and the mirror plane are united.

FIG. 29 is a diagram showing another embodiment of the present inventionwhen the micro lens and the mirror plane are united.

FIG. 30 is a diagram showing another embodiment of the present inventionwhen the micro prism and the mirror plane are united.

FIG. 31 is a diagram showing another embodiment of the present inventionwhen the modulation layer and the concave mirror are united.

FIG. 32 is a diagram showing one embodiment of the present inventionwhen using the shading layer for the spatial optical modulator.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

A description will now be provided of the preferred embodiments of thepresent invention with reference to the accompanying drawings.

FIG. 1 and FIG. 2 show a projection image display apparatus according tothe embodiment 1 of the present invention.

Specifically, FIG. 1 shows the projection image display apparatus of theembodiment and FIG. 2 shows an example of the pixel reduction unit.

In FIG. 1, reference numeral 1 is a white light source including ahigh-pressure mercury lamp with the reflector, 2 is an opticalintegrator, such as the fly eye lens, 3 is a color separation unit, suchas a color wheel, 4 is a spatial optical modulator, 5 is a polarizationbeam splitter (PBS), 6 is a macro lens, 7 is a pixel-profile deformationunit including a first micro-lens array 7 a and a second micro-lensarray 7 b, 8 is a projection lens, and 9 is a screen.

Although not illustrated in FIG. 1, an optical-axis shift unit isprovided in the projection lens 8 at the side of the pixel-profiledeformation unit, the optical-axis shift unit using the liquid crystalcell having the perpendicular orientation of the ferrodielectric liquidcrystal.

In FIG. 1, as for the intensity of the light coming out of the whitelight source 1 is equalized by the optical integrator 2, such as the flyeye lens. The optical integrator 2 may be constituted by two fly eyelenses and a condenser lens. Alternatively, the polarization beamsplitter (PBS) array for polarization conversion may be provided.

The color separation unit 3, such as the color wheel, separates theincident light into three colors of red, green, and blue.

When the color wheel is used, it does not separate the incident lightinto red, green, and blue simultaneously, but it separates the incidentlight into red, green, and blue sequentially.

The light goes into the polarization beam splitter 5, and it isreflected by the pixel of the spatial optical modulator 4, and the lightseparated for every color passes the polarization beam splitter 5, andgoes into the micro lens 6.

In the micro lens 6, a middle image of the pixel is formed on thesurface of the first micro-lens array 7 a. The first micro-lens array 7a acts as the field lens. The image profile of the middle image isdeformed by the second micro-lens array 7 b, and it is projected on thescreen 9 by the projection lens 8. The projection image is formed by thepixel profile by which the high precision image is deformed into thescreen 9.

In the embodiment, in the projection lens 8, the thickness of the liquidcrystal layer is about 100 micrometers. Two sets of optical-axis shiftunits are used for the liquid crystal cell having the perpendicularorientation of the ferrodielectric liquid crystal of the optical-axisshift unit (not shown). The half-wave plate is provided in the middle ofthe 2 sets of the optical-axis shift units, and it considered as theoptical-axis shift means in which the optical-axis shift of 4displacements of the horizontal direction 2 steps and the perpendiculardirection 2 steps is possible.

Since the electrode needed to apply the electric field to the substratetransverse direction, the dielectric thick-film layer and the strip-likeelectrode thereon are formed. Then, high voltage of 1 to 4 kV is appliedto the ends of the electrode. By the configuration, the optical-axisshift amounting to 5–10 micrometers in one direction is possible.

In order to realize the high-speed response as the spatial opticalmodulator 4 which is the indicating element, shifting the optical axisfor every sub-field is performed so that the image can be displayed, andthe LCOS (liquid crystal on silicon) of ferrodielectric liquid crystalis used.

The pixel pitch of the spatial optical modulator 4 is 13.2 micrometers.The micro lens 6 adjusts the imaging location relation so that the pixelpitch of 13.2 micrometers is suited for the micro-lens pitch of 14.0micrometers of the micro lenses 7 a and 7 b of the pixel-profiledeformation unit 7.

The imaging location relation is adjusted so that the pitch of LCOS andthe pitch of 14.0 micrometers of the micro lenses 7 a and 7 b of thepixel-profile deformation unit 7 may be in agreement.

As the spatial optical modulator 4, the penetrated type liquid crystalLV or the DMD (from Digital Instrument Co.) which useselevated-temperature polycrystal silicone in addition to the LCOS canalso be used. However, when using the DMD, the polarization beamsplitter 5 becomes unnecessary.

Moreover, the F value of the projection lens 8 is set to 2.4, and the Fvalue of the micro lens 6 is set to 4.0.

The pixel-profile deformation unit 7 as the pixel-profile deformationunit in FIG. 1 is shown in FIG. 2. As shown in FIG. 2, the pixel-profiledeformation unit 7 is formed by two sheets of the first micro-lens array7 a and the second micro-lens array 7 b. As the focal distance of thefirst micro-lens array 7 a could be large, in order that the power ofthe micro lens is made small, the pixel-profile deformation unit 7 isformed by the lamination type micro lens by the resin embedding. It isdesirable that the focal distance of the second micro-lens 7 b is small,and the second micro-lens array 7 b is taken as the air interface microlens.

The adjustment of the first micro-lens array 7 a and the secondmicro-lens array 7 b is performed by using the 6-axis stage (thedirection of the optical axis: z, the two directions perpendicular tothe optical axis: x, y, and the three rotation directions about the x,y, z-axis) for each of the micro-lens arrays 7 a and 7 b.

The lamination type first micro-lens array 7 a shown in FIG. 2 includesthe micro-lens array 7 c, the adhesive 7 d, and the transparent coveringmember 7 e. The material of the micro-lens array 7 c and the coveringmember 7 e used is glass.

More specifically, the pixel reduction unit by the micro lens of FIG. 2in the convex configuration micro lens is produced by dry etching of aneoseram substrate (or a crystallization transparent glass of NipponElectric Glass Co.) according to the resist transferring method. It iscombined with another neoseram substrate by using the UV photoresistadhesive (Kyoritu Kagaku Co., #7702) of a low index of refraction. Theadhesion hardening is carried out by the UV irradiation. The laminationtype first micro-lens array 7 a is produced in the manner.

The material is not limited to the above example, and any material maybe used if the index of refraction, the etching characteristics, and thethermal expansion coefficient are appropriately selected.

The expansion imaging of the projection pixel in the sub-field observedon the screen 9 of the projection image equipment shown in FIG. 1 iscarried out with the projection lens 8 in the pixel which has the pixelprofile by which the pixel-profile deformation unit 7 shown in FIG. 2 ischanged.

In the embodiment, by controlling appropriately the relative positionsof the first micro-lens array 7 a, the LCOS (the spatial opticalmodulator 4) and the micro lens 6, the focal distance thereof, and therelative position and the focal distance of the second micro-lens array7 b to the first micro-lens array 7 a, the relative optical intensitynear the edge of the pixel can be decreased by deforming the pixelprofile into a non-rectangular configuration that is different from theconventional rectangle configuration.

Accordingly, it is possible to provide a projection image displayapparatus in which the influence of the lap between the contiguitypixels when carrying out the optical-axis shift is reduced, and the“sharpness” of the image and the “smoothness of the field and the edge”are simultaneously realized.

Since the angle of the reflection light ray can be reduced by making thehalf-width of the pixel profile to the pixel pitch larger than the caseof the profile of the conventional rectangle configuration, thereflection of the outgoing light ray by the projection lens 8 isreduced, and the projection image display apparatus which effectivelyincrease the efficiency of use of the light can be realized.

The reduction of the outgoing beam angle is equivalent to the efficiencyof the lighting area when considering as the pixel unit corresponding tothe portion which weakens the grade of the efficiency pixel reductionhaving become large, and is based on the increase of the lightinginclude angle which is made into the pixel unit for the reason havingbeen controlled.

By the ability decreasing the relative optical intensity near the edgeof the pixel, the influence of the lap between the contiguity pixelswhen carrying out the optical-axis shift can be reduced, and the“sharpness” of the image and the “smoothness of the field and the edge”can be realized simultaneously. A detailed description of the matterwill be given in the following.

If the projection lens of a high MTF is used when forming the projectionimage which projected the pixel which has the pixel profile of therectangle configuration like LCOS with the projection lens.

Although the high resolution can be realized and the good “sharpness”can be realized by the projection pixel which has the projection pixelprofile of the abbreviation rectangle configuration corresponding to theoriginal pixel, they are the “hardness”, the “jaggies”, and the image inwhich “image discontinuity” is conspicuous and the “smoothness of thefield and the edge” has deteriorated.

On the contrary, the projection lens of low MTF may be used, or thefocus point of the projection lens of high MTF may be removed.

Although the “hardness”, the “jaggies”, and “the smoothness of the fieldand the edge” that reduced “image discontinuity” can realize the goodimage by the projection pixel which has the projection pixel profile ashaving given curvature to the edge portion and flat portion of therectangle configuration without making it correspond to the pixelprofile of the original pixel, only the projection image which“resolution” deteriorated as the and a trade-off and the “sharpness”reduced is unrealizable.

Since the optical intensity of the outgoing beam of the edge portion ofthe pixel of the is the same as that of a part for the center section ofthe pixel, it is for spreading widely to the range of the contiguitypixel corresponding to the point image function which has spreadcomparatively greatly corresponding to the projection lens of low MTF.

The spread of the outgoing beam to the contiguity pixel in the case isnot necessarily limited to one pixel of the nearest neighbors, andspreads the nearest-neighbors pixel in one pixel, the 2nd pixel set the2 pixels, or the 3rd pixel or more.

According to this embodiment, by providing the optical element 7, thepixel profile of the rectangle configuration of the LCOS (spatialoptical modulator 4) is deformed per pixel. Since the pixel profile ischanged into a non-rectanglar configuration, the pixel which has theresulting pixel profile is projected with the suitable projection lens 8of MTF so that the projection image is formed on the screen.

The influence of the outgoing beam of the edge portion of the pixelwhich has the same optical intensity as a part for the center section ofthe pixel can be reduced in this embodiment.

Accordingly, the relative optical intensity near the edge of the pixelcan be decreased according to the pixel profile of the non-rectangleconfiguration, the influence of the lap between the contiguity pixelswhen carrying out the optical-axis shift is reduced, and it is possibleto provide an image display apparatus which realizes the “sharpness” ofthe image and the “smoothness of the field and the edge” simultaneously.

Moreover, the angle of the outgoing light ray can be reduced byincreasing the relative value to the pixel pitch for the full width athalf maximum of the pixel profile, and the reflection of the outgoinglight ray can be reduced with the projection lens. Therefore, it ispossible to realize the image display apparatus which effectivelyincreases the efficiency of use of the light.

The influence of the outgoing beam near the edge of the pixel whichspreads to the pixel which adjoined based on the point spread functionof the projection lens 8 can be reduced by the deformation of the pixelprofile by the optical element 7 (the pixel-profile deformation unit),which more specifically prepared the relative optical intensity near theedge of the pixel.

Furthermore, the deformation of the pixel profile by the pixel-profiledeformation unit 7 for every pixel of the image differs from the pixelprofile of the rectangle configuration receiving the deformation withthe projection lens 8.

This depends on the ability to decrease greatly spreading thenearest-neighbors pixel in one pixel, the 2nd pixel set the 2 pixels, orthe 3rd pixel or more, since the optical action is carried out for thedeformation of the pixel profile per pixel by the optical element of thepixel unit although the pixel which carried out the nearest neighbors isaffected some and the optical action is the pixel unit therefore.

For the reason, cross talk with the contiguity pixel can be reducedgreatly.

Moreover, since the influence of the outgoing beam of the edge of thepixel is reduced to the pixel when the rate of the straight-lineaperture is larger than 50% and the relative value of the half-width ofthe pixel profile to pixel pitch is 70% or less, high “resolution” andthe good “sharpness” are realizable.

This can mean that it is seldom necessary to reduce the pixel, and onlythe part which is equivalent to at the rate and has reduced the spreadof the outgoing beam can raise optical use efficiency.

The relative value of the half-width of the pixel profile to the pixelpitch in the case is 70% or less preferably, and is 60% or less morepreferably.

Moreover, in the projection image display apparatus which prepared andhigh resolution the optical-axis shift unit which shows the pixel whichdeformed the pixel profile into the non-rectangle configuration(configuration which is not the rectangle configuration) to FIG. 1 bythe pixel-profile deformation unit 7 shown in FIG. 2, when it projectson the screen 9 with the projection lens 8, the pixel profile of theprojection pixel is also projected in the non-rectangle configuration.

When the relative value of the half-width of the projection pixelprofile as opposed to projection pixel pitch to the projection pixelwhich has the pixel profile of the non-rectangle configuration is 70% orless at the time, the reduction of the “hardness”, the “jaggies”, andthe projection image in which “the smoothness of the field and the edge”which reduced “image discontinuity” has the good image of realization ofthe good image and the “sharpness” with high “resolution” is completedlike the case of the pixel before the original projection.

FIG. 3 shows an example of the projection pixel profile of theprojection pixel of the image of the non-rectangle configurationdisplayed in the projection image display apparatus shown in FIG. 1 andFIG. 2.

In FIG. 3, the horizontal axis is made into the relative position on thescreen, the axis of ordinate is made into relative optical intensity, itis equivalent to the-die length whose nine points the horizontal axis ismm unit and are one pixel, and the axis of ordinate is the arbitraryunit.

As shown in FIG. 3, unlike the conventional projection pixel, the“hardness”, the “jaggies”, and the “image discontinuity” of theprojection image can be reduced, and good “smoothness of the field andthe edge” and good “sharpness” can be achieved with high “resolution”according to the present embodiment.

The pixel profile of the projection pixel which is deformed by thepixel-profile deformation unit 7 is measured by the method of projectingon CCD provided on the screen 9 by using the projection lens 8.

Moreover, it is deformed by the pixel-profile deformation unit 7, andthe pixel profile itself is measured simultaneously.

On the occasion of the measurement, the microscope has been arrangedinstead of the projection lens 8, and it measured by the method ofcarrying out incidence to CCD prepared in the imaging side of themicroscope.

At the time, the pixel profile measured under the microscope evaluatedNA of the projection lens 8, and NA of the microscope object lens by thesame appearance elevation by making it in agreement optically.

Moreover, the MTF of the projection lens 8 changes with imagequantities, and the evaluation on the optical axis is mainly performed.

Actually, it is desirable to combine the MTF of the projection lens 8with the required pixel profile deformation, and design and evaluate theinfluences of image quantity optimally.

FIG. 4 shows the composition of the embodiment 2 which united thepixel-profile deformation unit 10 of the present invention with LCOS.

In FIG. 4, reference numeral 11 is the silicon substrate, 12 is theliquid crystal layer, 13 is the middle substrate, 14 is the adhesivelayer, 15 is the micro-lens substrate, 16 is the convex configurationformed on the micro lens substrate, and 17, 18 and 19 are the opticalintensity distributions of the light ray which is equivalent to thepixel profile at the locations A, B and A′ as indicated in FIG. 4.

In FIG. 4, it is the back plain of LCOS, and the active unit andreflector by CMOS are formed in the silicon substrate 11 for everypixel, and the reflection-type spatial optical modulation in the pixelunit can be performed to it using the polarization lighting light andpolarization separation means by the liquid crystal layer 12 byimpressing the electric field to the liquid crystal layer 12 included bythe middle substrate 13 which has prepared ITO (not shown).

Moreover, by sticking the convex configuration 16 formed in themicro-lens substrate 15 with the middle substrate 13 using the adhesiveslayer 14, the lamination type micro lens is formed for every pixel, andthe micro lens and the reflector formed on the silicon substrate 11constitute the pixel-profile deformation unit 10.

In the location A which is the location which carried out incidence tothe pixel-profile deformation unit 10, since the incoming ray which arethe polarization lighting light shown by the dotted line which carriedout incidence from the left-hand side of FIG. 4 are beforehand madeuniform lighting, they have the pixel profile of the rectangleconfiguration.

Then, in the location B which is the location which passed thepixel-profile deformation unit 10 and carried out incidence to themirror plane of the silicon substrate 11, it becomes the pixel-profileconfiguration where the pixel profile of the original rectangleconfiguration is deformed into some, and is rounded.

In the location A′ which is the location which it is reflected by themirror plane of the silicon substrate 11, and carried out incidence tothe pixel-profile deformation unit 10 again, relative optical intensityof the surrounding edge of the pixel can be made small, and the fullwidth at half maximum (or the half-width) at that time deforms into thepixel profile which becomes smaller than the half life width of theoriginal drawing pixel.

The pixel profile changes with the locations of the direction of theoptical axis in accordance with the light ray corresponding to the pixelwhich has passed through the pixel-profile deformation unit 10 and isconverted to the reflection light ray as the outgoing light ray.

The projection pixel on which the pixel which has the pixel profilewhich is not the rectangle configuration is made to project can beobtained by arranging in the imaging-related location where LCOS and thescreen 9 of FIG. 4 which exchanged LCOS united with the pixel-profiledeformation unit 10 for LCOS of the embodiment 1 shown in FIG. 1,abbreviated the pixel-profile deformation unit 7 to the micro lens 6,and exchanged the projection lens 8 serve as the conjugate.

Accordingly, it is possible to provide an image display apparatus whichrealizes the “sharpness” of the image and the “smoothness of the fieldand the edge” simultaneously with the reduction of the “hardness”, the“jaggies”, and the “image discontinuity”, similar to the embodiment 1 ofFIG. 1.

Moreover, the angle of the outgoing light ray can be reduced byincreasing the relative value to the pixel pitch for the full width athalf maximum of the pixel profile, and the reflection of the outgoinglight ray can be reduced with the projection lens. Therefore, it ispossible to realize the image display apparatus which effectivelyincreases the efficiency of use of the light.

FIG. 5A shows an example of the result calculated using theoptical-design evaluation tool about the projection image including theprojection pixel on the screen 9 when using the pixel-profiledeformation unit 7 in the composition of the embodiment 1 which showedthe pixel-profile deformation unit of the present invention to FIG. 1united with LCOS used as the embodiment 3 of the present invention.

The projection image which displayed the “kanji” character is shown, thelattice-like pattern of about 30 is made to the check lengthwise, thepitch corresponding to the one lattice is equivalent to the pixel pitchof the original LCOS, and FIG. 5A is by the pixel-profile deformationunit 7.

It is projected with the projection lens 8 and the imaging of theprojection pixel is carried out to the screen 9 at the same time theoptical-axis shift unit carries out displacement of the optical locationby the time sharing, after this pixel profile is deformed.

In this embodiment, the field is compounded by the four sub-fields andthe optical-axis shift unit is the optical-axis shift unit whichperforms the 4-fold high resolution imaging as much increase as thenumber of the pixels of 2×2.

As in the projection image on the screen 9 of FIG. 5A, the experimentalmodel is manufactured in the composition as shown in FIG. 1, and whileperforming evaluation by the microscope and CCD which have been arrangedinstead of, calculation estimated the projection image including theprojection pixel on the screen 9 using the optical-design evaluationtool.

The number of the light rays is made into about 200,000–500,000 usingthe light-tools (the 3.2th edition) of the U.S. Optical ResearchAssociate Co. in which the non sequential ray-tracing analysis based onMonte Carlo method may be used as an optical-design evaluation tool(when a 1-GHz CPU is used it is the computational complexity for about50–100 minutes).

In order to reduce the burden of calculation, the ray tracing isperformed only about two or more pixels of the specific range, andcalculated and evaluated the optical intensity distribution in the largerange in the screen side by carrying out the convolution of theevaluation result obtained by the calculation evaluation tool of theseparate its original work in the light-tools.

Moreover, although it has normalized so that the highest light intensityvalue may turn into the constant value, for the reason, the average isnot necessarily fixed.

On the occasion of the modeling, the surface-integral cloth of thedischarge light of the high-pressure mercury lamp and the include-angledistribution are also taken into consideration, and the high-pressuremercury lamp aimed at adjustment with the experimental value furtherbased on the value of 150W class DC discharge lamp of Ushio Co. (the arclength: 1.1–1.2 mm).

The projection lens used for and designed separately the cord 5 (the8.6th edition) in which the sequential ray-tracing analysis of U.S.Optical Research Association Co. is possible besides the projection lensactually made as an experiment, and performed various evaluations.

Furthermore, the projection image by the experimental model is receivedin the image evaluation to the image on which it is projected.

The LCD and CRT which can display UXGA are used for the projection imageevaluated using the optical-design evaluation tool at the same time itcarries out directly. The 10×10 pixels to the 20×20 pixels are set tonew one pixel.

The subjectivity evaluation is performed in the state corresponding tothe resolution of 76–200 ppi to two or more observers, securinggradation nature and saving the pixel profile manufacturing as an imagewith the specific pixel profile, and changing the observation location.

As the numerical evaluation to the pixel profile immediately afterdeforming the pixel profile which becomes the origin of the pixelprofile of the projection image, and its projection, it considers as theevaluation value mainly concerned with the CTF and the full width athalf maximum (FWHM).

The full width at half maximum in the case of carrying out displacementof the optical location from the optical-axis shift unit to the pixelwhich deformed the pixel profile, and the definition of CTF aredescribed below.

FIG. 6A and FIG. 6B are diagrams for explaining the definition of thefull width at half maximum.

In FIG. 6A, the pixel S1 a of the 1st sub-field and S1 b are the Mingdisplays (white display) among the 1st–the 4th sub-field S1–S4, andpixel S4 a of the 4th sub-field and S4 b are dark displays (blackdisplay).

FIG. 6B shows the cross section of the pixel profile, as indicated bythe dotted chain line, which passes pixel S1 a to pixel S4 b.

The full width at half maximum is expressed with the value (W/P) [%]standardized the pixel periodicity P with which the width of face W ofthe value of the half of pixel peak intensity is projected on all thesub-fields at the time.

FIG. 7 is a diagram for explaining the definition of CTF according tothe present invention.

The horizontal axis is the relative position of the directionperpendicular to the optical axis of the pixel or the projection pixel,and the axis of ordinate is the optical intensity of the pixel or theprojection pixel.

As shown in FIG. 7, when the image input to the spatial opticalmodulator repeats white and black in the shape of a line, as for thepixel or the projection image, the black level comes floating.

If the maximum of projection image intensity is set to P1 and theminimum value is set to P0, the CTF (contrast transfer function) will bedefined by the following formula (1).CTF=(P1−P0)/(P1+P0)×100%   (1)

This corresponds to MTF (modulation transfer function) which is thespatial transfer function, that the origin is the line & tooth space ofthe rectangle configuration by the spatial optical modulator differsfrom the actual spatial frequency and the frequency of the unit by theFourier expansion.

FIG. 8A and FIG. 8B are diagrams for explaining the definition of CTFwhen using the pixel-profile deformation unit and the optical-axis shiftunit.

The profile 1 indicated by the solid line in FIG. 8B is the profile incase pixel S1 a of the 1st sub-field S1 and S1 b are the Ming displays,and the profiles 2 indicated by the dotted dash line in FIG. 8B arepixel S4 a of the 4th sub-field S4, and the profile of S4 b.

The intensity of the portion (indicated by the arrow portion of FIG. 8B)which crosses pixel S4 a equivalent to the contiguity pixel of pixel S1a is called “skirt intensity.”

Hereafter, let the skirt intensity be the value standardized by themaximum intensity of the pixel.

The CTF of the projection image will become high, so that the skirtintensity is small.

At the time, the projection images shown in FIG. 5A are CTF=40 and thehalf-widthe 50 (% notation omitted).

As shown in FIG. 5A, in spite of being the resolution of the characterincluding square of the few number of the pixels of the 10 pixels andthe 12 pixels, it turns out that it is the projection image which candecipher the “rose” character easily and provide high “resolution” andgood “sharpness”.

On the other hand, the continuity of the white background and the blackline is uniform, and it turns out that it also provide the projectionimage with good “smoothness of the field and the edge.”

FIG. 5B and FIG. 5C show the comparative example 1, and the comparativeexample 2.

In the case of the CTF=40 and the half width=30 in the embodiment 1,FIG. 5B and FIG. 5C show the projection images which correspond in thecase of the CTF=80 and the half width=50 respectively.

The embodiment 1 has “resolution” higher than the comparative examples 1and 2, and good “sharpness” so that FIG. 5A which shows the result ofthe embodiment 1, and FIG. 5B which shows the comparative examples 1 and2 and FIG. 5C may be compared and understood.

Simultaneously, it turns out that “the smoothness of the field and theedge” is the good projection image.

FIG. 9A is the example 1 for reference used as an example of theprojection image for explaining the item of the subjectivity evaluationto the image quality of the projection image.

FIG. 9A is an example of the projection image measured by CCD arrangedon the screen 9 when combining the pixel-profile, deformation unit 7 andoptical-axis shift unit which are projected by composition of theembodiment 1 shown in the FIG. 1.

FIG. 9A is the example on which the case where it displayed in thewhite-character of the display in white is displayed, in order to makethe beam configuration easy to see not for the black character whichused the character of “R” (+“I”) for the usual image evaluation but forexplanation.

In this embodiment, the “R” is displayed as compared with the characterincluding 16 pixels which do not use the optical-axis shift unit, byusing 32 pixels which use the optical-axis shift unit, and theprojection image according to this embodiment has high “resolution” andgood “sharpness.”

However, the full width at half maximum of the pixel is small, and it isthe projection image which is inferior to some in the visibility in that“the smoothness of the field” lacks in the thick white line whichconstitutes “R.”

Similarly, although “the smoothness of the edge” has improved bygradation control, it is the projection image inadequate for some.

However, such fault is changing CTF and can improve.

FIG. 9B shows other examples of the projection image for explaining theitem of the subjectivity evaluation to the image quality of theprojection image.

FIG. 9B is an example of the projection image measured by CCD arrangedon the 9th page of the screen when omitting and projecting thepixel-profile deformation unit 7 and the optical-axis shift unit out ofthe composition of the embodiment 1 as shown in FIG. 1.

In FIG. 9B, since it is displayed in the character in which thecharacter of “R” (+“I”) consists of the number of the pixels with asquare of with the 16 pixels, the “resolution” and the “sharpness” havedeteriorated.

It is the image in which the “hardness” and the “jaggies” areconspicuous though it fully observes and evaluates from a distance,since the pixel of the rectangle configuration is projected.

However, about the white ground and black figures, it has “smoothness ofthe field” good enough.

The comprehensive result when forming the projection image forevaluation by calculation and the experiment, and carrying outsubjectivity evaluation is shown in Table 1 like the FIG. 5 of theembodiment 3.

The projection image for evaluation is evaluated, after also changingthe location and characteristics of the projection lens and optimizing,while changing the optical characteristics of the pixel-profiledeformation unit.

TABLE 1 CTF Skirt Intensity Half-Width (%) (%) (%) 30 40 50 60 70 80 3054 D E D E E D 40 43 D C B B B D 50 33 B B A A A D 80 11 B E A E A D

Concerning the rating of image quality in Table 1, A indicates verygood, B indicates good, C indicates acceptable, D indicatesnon-acceptable, and E indicates non-evaluation. Plural evaluations ofthe image (the embodiment 4) for the gradation, the sharpness and thenoise have been given by ten observers based on the five phases ofscaling which is the series criteria method. The result of 4.5 or moreis Rating=A, the result of 4 or more points is Rating=B, the result of 3or more points is Rating=C, the result of less than 3 points isRating=D.

Subjectivity evaluation performed the projection image for evaluation tothe ten observers based on the five phases of scaling which is theseries criteria method.

The “sharpness” and the “jaggies” of the image which are mainly theindex concerning the “smoothness of the field and the line” of the imageusing the evaluation based on the five phases of the scaling.

Although the above is the result of being related when increasing thenumber of the pixels the 4-fold (=2×2) imaging, when the number of thepixels is increased the 9-fold (=3×3) imaging, it will become large withthe value.

It is because the lap arises between the pixels, the CTF deterioratesand the quality of image deteriorates, since it is the configurationwhere the profile lengthened the foot.

When the level which shifts the optical axis by the optical-axis shiftunit is three or more pixels (except two), it is desirable that they are0.7×⅔ times the rate of the pixel size reduction.

The image of the same convolution as the twice as many the optical-axisshift can be acquired by this, and degradation of the resolution by thecross talk between the adjoining pixels can be reduced also in the3-fold or 4-fold one as many optical-axis shift as this.

As shown in Table 1, when the pixel profile is deformed into the pixelprofile which is not the rectangle configuration, it turns out that thegood projection image is acquired for the full width at half maximumalso by the case of 70 at the maximum.

Moreover, even if CTF is 40% or more, it turns out that the goodprojection image is obtained. It is desirable that the CTF is less than80% and more than 40%. It is more desirable that the CTF is less than70% and more than 50%.

When the full width at half maximum is 70% or less and the CTF is morethan 50% at the maximum, it turns out that a very good projection imageis acquired.

Moreover, although not indicated in Table 1, most image quality canimprove the optical use efficiency greatly by making the full width athalf maximum larger than 50%, without making it deteriorate, it is moredesirable, from the point of acquiring the bright image, that the fullwidth at half maximum is larger than 50%.

In the case of the pixel-profile deformation unit 10 by the micro-lensarray which is united with the LCOS of composition of having been shownin FIG. 4, the thickness of the transparent substrate 11 is set to t,the radius of curvature is set to r, and the thickness of the adhesiveslayer 14 is set to 4 micrometers, with the index of refraction 1.4.

The model A of Table 2 is the embodiment 5 more at the detail.

The CTF on the plane of projection when using the pixel reductionoptical system and the full width at half maximum, and the optical useefficiency of the optical system are searched for in ray-tracingsimulation.

The models B and C which are the following examples of comparison arealso indicated to Table 2.

TABLE 2 n t (μm) r (μm) CTF (%) η (%) α (%) Model A 1.84 10 21.2 81.559.4 71.0 Model B 1.75 22 10 70.0 57.6 50.3 Model C 1.75 13 13 64.6 56.751.7

The models B and C of the example of comparison are the same as that ofthe embodiment 5 except being the pixel-profile deformation unit fromwhich the pixel in the plane of incidence serves as half, and the fullwidth at half maximum serves as about 50%.

Compared with Models B and C, Model A is understood that CTF whichoptical use efficiency is not concerned about the same, but expressesdefinition ability is high.

Moreover, the burden to the pixel reduction optical-system design withthe larger full width at half maximum than 50% can decrease, thereforeit can raise both definition ability and optical use efficiency.

Let the micro lens (convex configuration 16), the index of refraction nof the transparent substrate 11 and thickness t of the transparentsubstrate 11, and the radius of curvature r of the micro lens (convexconfiguration 16) be the pixel reduction optical systems of thepublication in the composition of the FIG. 4 at the model D of Table 3.

In the embodiment, there is about 83% of optical use efficiency of thepixel reduction optical system.

The data of Models B and C are also written together to Table 3 as anexample of comparison.

Since the good projection image is acquired from Table 3 and Table 1even if the definition ability (CTF) of the projection image is notnecessarily high, and CTF and optical use efficiency have the relationof the trade-off from it, if it holds down to the engine performancelower if CTF is 40% or more, the projection image display apparatus withthe optical high use efficiency of the optical system can be offered.

TABLE 3 n t (μm) r (μm) CTF (%) η (%) α (%) Model D 1.63 20 10 40.5 82.855.0 Model B 1.75 22 10 70.0 57.6 50.3 Model C 1.75 17 13 64.6 56.7 51.7

In this-embodiment, it is assumed that the full width at half maximum isless than 70%, and the skirt intensity CTF is larger than 50%.

Let the micro lens (convex configuration 16), the index of refraction nof the transparent substrate 11 and thickness t of the transparentsubstrate 11, and the radius of curvature r of the micro lens (convexconfiguration 16) be the pixel reduction optical systems of thepublication in the composition of the FIG. 4 at the model F of Table 4.

Model F is an example to which the full width at half maximum of theprojection pixel profile fills CTF>=50% of the projection image withless than 70%.

As an example of comparison, Model G is written together to Table 4.

With Model G, in the example from which the full width at half maximumbecomes 70% or more, it is high, but on the other hand the part with thesmall reduction effectiveness and the optical use efficiency become thedefinition ability CTF of the projection image very small.

50% shows that P0/P1=0.33, i.e., the relative intensity of the portionwhich crosses the contiguity pixel, are 33% from the formula 1 in CTF ofthe projection image.

Therefore, the projection image display apparatus with the full width athalf maximum sufficient the balance with the optical system by which theprofile from which less than 70% and the skirt intensity become lessthan 33% is obtained and the optical use efficiency on the plane ofincidence is obtained like this embodiment.

More preferably, the full width at half maximum is larger than 30% andless than 70%, and the skirt intensity is less than 33%.

On the above condition, the jaggies of the image that are easilyconspicuous can be reduced.

TABLE 4 n t (μm) r (μm) CTF (%) η (%) α (%) Model F 1.63 35 10 57.0 61.260.1 Model G 1.52 30 10 27.5 90.0 98.4

FIG. 10 shows the characteristics of an example of the pixel profileaccording to the embodiment 8 of the invention which is deformed into apixel profile having the pixel of the rectangle-like pixel profile andthe shape of a concave near the center of the pixel.

As the profile of each pixel on which it is projected by the screen inthe embodiment is shown in FIG. 10, it becomes the circumference of thepixel. At the relative positions (−0.1 to +0.1) of the horizontal axisof FIG. 10, the optical intensity drops.

The pixel is shifted by the optical-axis shift unit, and the case of theimage used as the maximum spatial frequency, i.e., the display image towhich the contiguity pixel repeats ON and OFF, it becomes as it is shownin FIG. 11, when the profile in the screen is calculated.

When the circumference intensity of one pixel profile on which it isprojected falls, the good image is acquired even if it displays theimage used as the maximum spatial frequency.

The good visibility by higher resolution and the smooth image andoptical, still higher use efficiency are realizable by not being therectangle-like, and realizing the pixel profile of the specialconfiguration which has the 0/00{hacek over (s)} in the center sectionupwards by the original pixel or the pixel on the screen, andcontrolling the configuration appropriately.

Although the is the same as the configuration of the two crests, thepower intensity against the ends is distributed, the optical intensitywhich is the original pixel is the ends side of the edge and the centerof the pixel, and it will be concentrated inside the edge.

Furthermore, although the spatial frequency which the female of thecenter section of the one pixel gives is high, and MTF of the projectionlens and the observer's MTF serve as the small spatial frequency and canmeasure in CCD, in actual subjectivity evaluation, the visibility is lowand the point does not pose the problem.

For the reason, from the shape of a conventional rectangle, since theportion of the shoulder of the edge has curvature, though between thepixels which adjoined laps, the edge rises, and it is bad invisible.

On the other hand, the visibility with the flat luminance whose peak ofthe two crests is the pixel is given, in the case of the conventionalrectangle profile, and the pixel portion where the recess is small,which does not lap since it cannot elapse and judge is checked bylooking with the pixel with flat good luminance.

The optical energy of the female of the center section becomes two crestportions, from considering as near the edge of the adjacent part betweenthe pixels with which it does not lap when carrying out the optical-axisshift, the smoothness, simultaneously sharpness are also realized andhigh resolution can be realized

If it becomes blunt with the rectangle drawing projection lens, to theinclination which the edge of both shoulders falls by making the centersection into the convex, and becomes in sine, the pixel profile with thefemale of 2 crests will have the small ratio from which the centersection becomes the convex to the ratio from which the edge of bothshoulders falls, and it will be hard to be influenced of MTFdegradation.

FIG. 12A (Rating B), FIG. 12B (Rating B), and FIG. 12C (Rating C) arethe examples of the results of calculation concerning the projectionimage including the projection pixel on the screen 9 when using thepixel-profile deformation unit 7 in the composition of the embodiment 1which showed the pixel-profile deformation unit to FIG. 1 united withthe LCOS similar to the case of the embodiment 3 of the presentinvention using the optical-design evaluation tool.

Table 5 shows the comprehensive result when forming the projection imagefor evaluation by calculation and the experiment, and carrying outsubjectivity evaluation as well as the case of Table 1 of the embodiment4 (minimum value of the recess intensity estimated as the best and goodimage [%]).

In Table 5, the projection image for evaluation is evaluated, after alsochanging the location and characteristics of the projection lens andoptimizing, while changing the optical characteristics of thepixel-profile deformation unit.

TABLE 5 α (%) 50 60 70 CTF (%) 40 0 40 80 50 0 40 80 60 0  0 80

In this embedment, as shown in Table 5, if the recess intensity is 40%or more of peak intensity preferably, the good image will be acquired.

Furthermore, if it is the projection pixel profile more preferably sothat it may become 80% of peak intensity, it will provide the projectionimage display apparatus having high optical use efficiency. However, the“smoothness of the image” deteriorates conversely when the peakintensity is 100%. For the reason, it is desirable that the peakintensity is 95% or less. It is more desirable that the peak intensityis larger than 80% and less than 90%.

If the full width at half maximum is less than 60% in general, even ifthe pixel profile has the depression of the center of the pixel, thegood projection image is acquired from the simulation result (Table 5)of the above-mentioned pixel profile.

Furthermore, when the central depression portion is the pixel profilewhich is about 80% of the maximum intensity, the projection image withthe full width at half maximum good (it is at least less than 70%) isacquired.

In this embodiment, the ray-tracing calculation investigated the profileon the plane of incidence when displaying one pixel or one line, is usedwith the index of refraction of the micro lens (convex configuration 16)in the composition of FIG. 4 and the index of refraction of thetransparent substrate 11 being set to 1.75, the thickness of thetransparent substrate 11 being set to 15 micrometers, and the radius ofcurvature of the micro lens (convex configuration 16) being set to 10micrometers.

FIG. 10 shows the result of the above calculations.

In FIG. 10, the horizontal axis expresses the location on the plane ofincidence, and the axis of ordinate expresses the intensity of theprojection image.

Table 6 shows the characteristics of the image on the plane of incidenceacquired in this embodiment. The intensity of the center of the pixel isabout 56% of the peak. Preferably, if the intensity of the center of thepixel is the profile of the shape of a concave which becomes 40% or moreof the peak, it will be the image used as the maximum spatial frequencywhen carrying out the wobbling, and the better image will be acquired.

TABLE 6 n t (μm) r (μm) CTF (%) η (%) α (%) Model H 1.75 15 10 79.4 53.157.5

As shown in Table 6, the characteristics which are not inferioritycompared with the above comparative examples are acquired.

Moreover, from the result of Table 5, if the full width at half maximumof the projection image is about 50%, it would not be influenced by theintensity of the portion which crosses the contiguity pixel, but theintensity near the pixel center may fall to 0.

The good projection image is acquired by this embodiment, using themicro-lens array shown in the model A in Table 2, the model D in Table3, the model F of Table 4, and the model H in Table 6 as the pixelreduction optical unit.

Although the pixel reduction optical system is installed'in near and thespace modulator itself of the spatial optical modulator in eachembodiment, the need of adhering to especially these composition may becomposition which there is not and has arranged the micro lens betweenthe micro-lens array and the spatial optical modulator.

FIG. 13 shows an example of the pixel-profile deformation unit for usein the image display apparatus of the embodiment 11 of the presentinvention.

As shown in FIG. 13, the pixel-profile deformation unit 21 of thisembodiment includes a gradient-index lens array 22 corresponding to thepixel pitch of the spatial optical modulator in the pixel reductionoptical system, as shown in FIG. 13. In the lens array 22, therefractive index is distributed therein.

In FIG. 13, reference numeral 23 is the liquid crystal layer, 24 is theflattened layer, and 25 is the back plain.

The good image is acquired by providing the gradient-index-lens array 22of this embodiment so that it may become the same range as the case ofthe previous embodiment having the profile of the projection pixelmentioned above.

The case of the form of the operation may also be the composition whichhas arranged the micro lens between the spatial optical modulator andthe gradient-index-lens array 22.

FIG. 14 shows an example of the image display apparatus according to theembodiment 12 of the present invention.

As shown in FIG. 14, the reflection-type liquid crystal unit is used forthe pixel-profile deformation unit 31 of the embodiment as a spatialoptical modulator, including the transparent substrate 32, the liquidcrystal layer 33, and the back plain 34, and the TFT for the back plain34 driving the liquid crystal etc. is accumulated.

With the conventional reflection-type liquid crystal unit (the liquidcrystal unit called especially the LCOS), the maximum surface of theback plain is the reflector plate.

The reflector plate of the pixel-profile deformation unit includes aconcave surface mirror array 35, and the concave surface mirror array 35and the liquid crystal layer 33 of the embodiment 12 includes theflattened layer 36. The concave surface mirror array 35 includes theconcave surface mirror.

As a liquid crystal unit, although the transference electrode, theorientation film, etc. are required suitably, since these detailedexplanation is unnecessary, for explanation of the pixel reductionoptical system, it is omitted by view 14.

In FIG. 14, the index of refraction of the flattened layer 36 is set to1.52, and the radius of curvature of the concave surface mirror array 35is set to 150 micrometers. A description of the thickness of the liquidcrystal layer 33 and the thickness of the transparent substrate 32 willbe omitted as they are negligible with respect to the effectiveness ofthe embodiment.

When the ray-tracing calculation is carried out with the composition ofthe embodiment 12 of the invention, the characteristics shown in Table 7are acquired.

As is apparent from the results of Table 1 and Table 7, the embodiment12 makes it possible to prove good efficiency and high resolutionprojection image.

TABLE 7 CTF (%) η (%) α (%) 81.9 80.1 70.1

FIG. 15 shows an example of composition of the embodiment 13 of thepresent invention. In this embodiment, the pixel reduction opticalsystem is configured by using the aperture array.

The reflection-type liquid crystal unit 41 of the embodiment 13 isprovided as a spatial optical modulator, and it includes the liquidcrystal layer 42, the covered parts 44 and the micro lens 45 to whichthe pixel reduction optical system limits the aperture 43 to the liquidcrystal layer 42 or in the vicinity of the liquid crystal layer 42.

In FIG. 15, reference numeral 46 is the transparent substrate, andreference numeral 47 is the back plain.

Usually, the liquid crystal unit makes small magnitude of the pixel ofspatial optical-modulator 41 the very thing by lowering the rate of theaperture positively conversely in the embodiment, although the devicewhich makes the rate of the aperture high is made.

Table 8 is the result of calculations by changing the area of thecovered part 44 to three different values.

If the rate of the aperture is made 60%, the CTF which shows thedefinition ability of the projection image will be 100%.

That is, the contiguity pixel by which the wobbling is carried out isnot crossed.

TABLE 8 Aperture Ratio (%) CTF (%) η (%) α (%) 80 47.5 79.2 85.2 70 83.369.3 79.9 60 100.0  59.4 77.5

The full width at half maximum of the projection pixel profile of theembodiment 13 is about 78%, and according to Table 1, it is close to theimage (the full width at half maximum is 80% or more) which is not good.

However, since CTF is high, the high resolution image is acquired inTable 8.

FIG. 18 shows an example of composition of the embodiment 14 of theimage display apparatus of the present invention.

Specifically, FIG. 18 shows the cross section of the reflection-typelight valve which has the concave mirror used as the pixel-profiledeformation unit for every pixel in the reflection-type image displayapparatus which increases the resolution of the original reflection-typelight valve using the optical-axis shift unit.

Only the basic composition of the reflection-type light valve is shownin FIG. 18.

As shown in FIG. 18, the picture element used as the space opticalmodulator includes the reflective concave surface configuration 51, theembedding layer 52 which is the layer of a transparent material, and theliquid crystal layer 54.

The reflection electrode 56 is provided between the reflective concavesurface configuration 51 and the embedding layer 52.

On the embedding layer 52, the flattened layer 53 is provided. Thetransparent electrode 57 is provided above the upper surface of theflattened layer 53 and under the liquid crystal layer 54. The oppositesubstrate 55 is formed on the liquid crystal layer 54, and thetransparent electrode 58 is separately formed in the liquid crystal sideof the opposite substrate 55.

Although illustration is not carried out for the transference electrode57 and the reflector 56, they are separately provided for every pixel,and they are electrically connected together by the through-hole fillingmaterial 59.

The index of refraction of the embedding layer 52 is set to n, and theradius of curvature of the concave surface reflector plate 51 is set tor.

The SiO₂ substrate with the elevated-temperature pSi, or the siliconsubstrate is used for the substrate of the reflective concave mirror 1.

The thin films, such as ITO, are used for the electrode 57 with the thinfilm of the metals, such as aluminum, transparent again by the reflector56.

FIG. 19 shows the outline of the operation of the embodiment 14 of FIG.18.

FIG. 19 shows the condition that the image of the pixel is formed byoperation and the reflective concave mirror of irradiation beam in theembodiment 14 of FIG. 18.

As for the incoming light 60, only the parallel light is shown in FIG.19. The incoming light 60 passes through the liquid crystal layer 4 andthe translucent flattened layer 53, and is incident to the reflectiveconcave mirror 51. It is reflected and focused by the reflective concavemirror 51, and the new reduced pixel 62 is in the focusing state of thepixel near portion 61, and the focal point f to which the pixel size isreduced is formed.

In FIG. 19, the reduced pixel 62 has spread because the light ray of thelight source spreads, and there is the lighting angle (angle ofdivergence) (see FIG. 20).

When it sees geometrically, the magnitude of the reduced pixel has themagnitude according to the lighting angle and the focal distance.According to the yield, the reduced pixel becomes still larger.

In projecting the pixel profile of the reduced pixel that deformed onthe screen using the projection lens, corresponding to the transferfunction of the projection lens, it receives the deformation of thefurther pixel profile.

However, the reflection light from the pixel can form the focusing stateby which pixel reduction is carried out at the near portion 61 the focallocation of the reflective concave mirror 1 by optimizing these.

FIG. 20 shows the relation between maximum angle θ in at the time ofincidence to the pixel, and maximum angle θ out at the time ofreflection or outgoing.

The θ in is determined by the irradiation optical system, and about theincident light to irradiate, although it is the fixed value, the θ outchanges with n and r.

In FIG. 20, although the θ out is considering as the angle of about halfof the spreading of the light ray, when the pixel size is reduced toabout ½, it serves as the twice as many the angle (+/−θ out) as this.

Since the pixel profile in the focusing state where pixel size isreduced is near the focus of the optical element as shown in FIG. 20,the include-angle distribution of the irradiation beam to the pixel alsoinfluences greatly.

It is desirable for the rates of reduction of the pixel to differgreatly, and to optimize these by characteristics, the locationrelation, etc. of the contour configuration of the pixel itself, thecurvature profile of the concave mirror, and the projection lens.

When carrying out pixel reduction of the reflection light with theconcave mirror, it is not only necessary to set the pixel size to onehalf. P The pixel profile which deformed when performing high-resolutionimaging using the optical-axis shift unit is not only the rate ofreduction of the pixel, and the visibility, such as resolution of theimage and the smoothness, is not necessarily determined.

Also in the same rate of pixel reduction, if the pixel profiles differ,it may become the greatly different visibility.

Even if pixel size is not ½, the big difference may not be accepted inthe visibility.

FIG. 21 shows the embodiment 15 of the image display apparatus of thepresent invention.

The pixel profile which acts as reflection from the reflective concavemirror by the reflection-type light valve which can set the embodiment14 (it acts as reflection from the pixel) is deformed, and the unit forwhich the pixel to which pixel size is reduced modulates the light path(it shifts spatially) shows operation which increases the number of thepixels (image of the pixel).

In the embodiment, the piezoelectric elements 72 and 73 are used asmeans to modulate the light path of the light which acted as reflectionfrom the pixel of the spatial optical modulator 71 (it sees at rightangles to the optical axis).

This moves mechanically special modulation unit 71 by using thepiezoelectric elements 72 and 73.

In order for the unit itself to move, the pixel will also move.

If the piezoelectric element is used, even if pixel size will be aboutten micrometers or less, the light path not more than it can be shifted.

The piezoelectric elements 72 and 73 are installed in the y-axisorientation 75 and the x-axis orientation 76 on the spatial opticalmodulator 71 and the jig 74, and they are moved periodically.

In addition, the z-axis is the direction perpendicular to the surface ofthe drawing, and is in agreement with the optical axis.

The pixel profile which acts as-reflection from the reflective concavemirror by the reflection-type light valve in the embodiment 14 of FIG.18 is deformed as in FIG. 22A to FIG. 22G, it is projected on the pixelto which the pixel size is reduced by the screen by the optical-axisshift unit in the embodiment 15 of FIG. 21, and operation from which itbecomes the image of the high resolution is shown.

Here, the rate of reduction (α) of the pixel size by the micro-lensarray is set to one half.

The pixel of the spatial optical modulator is the square, and it is thesquare reduction image-noting that it is reduced ideally.

The initial state which is not moving probably is set to the state ofFIG. 22A.

The state where the pixel size of the spatial optical modulator made itshift ½ in the direction of y is set to the state of FIG. 22B.

When the pixel size is set to 14 micrometers, delta x and delta y areset to 7 micrometers.

The state where the pixel size is made to shift by ½ from the state ofFIG. 22B in the x directions is the state of FIG. 22C.

The state where pixel size made it shift by ½ in the direction (theminus direction) opposite to FIG. 22B is the state of FIG. 22D.

The state where it is made to shift in the direction opposite to FIG.22C is the sate of FIG. 22E.

The state where pixel size made it shift ½ in the direction of y is thestate of FIG. 22F.

Subsequently, it returns to the state of FIG. 22A.

Consequently, the high precision imaging (FIG. 22G) is performed so thatthe size of the one side of the pixel is ½, and it is the 4-fold highresolution imaging that can be realized without sensing the flicker ofthe image, if the periodicity of these shifts is small.

Moreover, in the example, since the optical system is extended since thespatial optical modulator and light-path modulation means become the onedevice, and it becomes unnecessary to intercalate light-path modulationequipment, it leads to the miniaturization of equipment.

Although the above-mentioned example is moved in the two directions of xand y, it is possible to be the shift of the direction of either x or y.In this case, the pixel size is doubled.

Moreover, the 9-fold high resolution imaging as many increase in thenumber of the pixels as the can expect the amount of shifts by ⅓, then3×3, using alpha as one third.

What is necessary is just the light-path shifting unit which shifts thelight path in space coordinates, also besides moving the reflection-typelight valve mechanically directly, using the optical element using theliquid crystal which is the double-refraction material, the parallelshift of the optical axis may be carried out, the optical axis may bedeflected, or the optical-axis shift unit of FIG. 21 may performsimultaneously the parallel shift of the optical axis, and the deviationof the optical axis.

It is possible to carry out the displacement of the transparent memberfrom which the wedge configuration and the optical path arranged aslantdiffer mechanically.

FIG. 23 shows the embodiment 16 from which the pixel to which the pixelprofile which acts as reflection from the reflective concave mirror bythe reflection-type light valve which can set the embodiment 14 of FIG.18 is deformed into based on operation shown by FIG. 22A or FIG. 22G,and pixel size is reduced serves as composition of the image displayapparatus which is projected by the time sharing by the screen by theoptical-axis shift unit in the embodiment 15 of FIG. 21, and realizesthe image display of the high resolution.

Specifically, it is related with the high precision image projectionequipment (projector) which uses the above-mentioned image displayapparatus of high precision imaging.

As an example, the example of the veneer formula projector which usesone reflection-type spatial optical modulator is shown.

In FIG. 23, as for the light which came out of the white light source81, the illuminance is first equalized by the equalization opticalelements (optical integrator) 82, such as the fly eye lens.

Next, the color separation units 83, such as the color wheel, separateinto the three colors of red, green, and blue.

When the color wheel is used, simultaneously, it does not separate intored, green, and blue, but red, green, and blue separate into the timeseries.

Next, it goes into the polarization beam splitter 85 for every color, isreflected by the pixel of the spatial optical modulator (reflection-typeliquid crystal light valve) 84, and escapes from the polarization beamsplitter 85, and finally, it is projected with the projection lens 86and the high precision image is formed in the screen 87.

Besides LCOS which is the reflection-type light valve given in theembodiment 14 of FIG. 18 as a spatial optical modulator, the MEMStechnique may be used like DMD and the reflection-type deviation unitmay be used.

Moreover, the method using the spatial optical modulator is notrestricted to the veneer formula of FIG. 23, and its reliance is alsogood at 3 plate type and 2 plate type.

Since the spatial optical modulator combines with the optical-axis shiftunit, it is desirable that it is the thing of the high-speed response.

The image display apparatus which is made to expand the image and isdisplayed is sufficient by using the magnifying lens for virtual-imageformation in which the virtual-image display like the magnifier ispossible, and expanding as a virtual image besides the equipment whichdisplays the image of the high resolution which expanded the reducedpixel by which the pixel profile is deformed like the projector shown inFIG. 23 by the imaging with which the relation of the conjugate isfilled using the projection lens.

Thereby, it is possible for the image display apparatus of thisembodiment to provide a small display for the finder of a video camera,a head mounted display, a cellular phone, etc.

When the reflection-type light valve is combined with the optical-axisshift unit in the present invention and the high resolution is displayedusing the reflection-type pixel reduction unit, the difference in theaction when comparing with the case where the pixel reduction by themicro lens on the conventional opposite substrate is used is explainedbelow.

It sets to the reflection-type light valve with the composition shown inthe FIG. 18 of the embodiment 14 and FIG. 21, and FIG. 23.

The time of making the opposite substrate, since the required opticalelement of alignment is not prepared in the silicon substrate which hasthe reflector, and the substrate which counters unlike the case wherethe conventional micro lens is prepared in the light source side whenthe pixel profile is deformed, it is necessary to use neither large sumsuperposition equipment nor the vibration-proofing facility at the timeof attachment.

Moreover, when the yield of attachment also improves greatly, theimaging can be carried out easily at low cost.

Since the pixel profile does not change even if the horizontal locationgap with the opposite substrate arises after attachment, it comes toexcel in dependability.

By the glass substrate and silicon substrate which are usually used asan opposite substrate, since the difference is in the coefficient ofexpansion, the process temperature at the time of production and the useenvironment as a product had big restrictions.

In the silicon substrate of 1 inch of vertical angles, and the usualoptical glass, even the temperature change of 10 degrees produces thedilation difference for several microns location gap at the ends.

In the temperature change of 100 degrees in the process of 120–150degrees of adhesion hardening, there is the dilation difference 10microns or more for the location gap.

These serve as location gap directly, or damage the liquid crystalspacer, or serve as camber and deteriorate the characteristics of thereflection-type light valve.

However, the influence of location gap is cancelable, and while it ismore at low cost and can produce, the dependability under the severeenvironments, such as the cold district and in the car in summer, can beimproved greatly.

Since the influence does not exist although the absolute location gapincreases even if it uses the 2 inches large-sized reflection-type lightvalve, making the reflection-type light valve large-sized can alsoimprove resolution more.

Since the unit which deforms the pixel profile into thesilicon-substrate side is prepared unlike the case where theconventional micro lens is prepared in the light source side when thepixel profile is deformed in the reflection-type light valve with thecomposition shown in FIG. 18 of the embodiment 14 and FIG. 21, and FIG.23

The liquid crystal layer is again penetrated after that in response tothe action of the optical element which deforms the pixel profile afterlighting light penetrates as it is first by using as the aperture theliquid crystal layer separately switched by polarization rotationcombining the polarization separation unit.

For the reason, even if the micro lens by the side of the conventionallight source gives the focusing function in order to reduce the firstpixel profile, it may be expanded to the return and may be unable tocontract.

Although the focal distance of the micro lens can be changed, the onelens can be made to be both able to act effectively in the outward tripand the return trip and pixel reduction can also be performed

It is easy to receive limitation of the thickness of the lighting angleor the substrate, and the configuration of the micro lens etc., andsince it is the one lens, and the power of the lens in the outward tripand the return trip is inevitably the same, the resolution and theoptical capacity factor in the case of changing the pixel profile canalso fully use neither the brighter lighting angle nor the darkerprojection lens.

On the other hand, the micro lens of the present invention can act bythe light path after it, without the liquid crystal layer of thebeginning of the outward trip acting. The resolution is better and itcomes to design the deformation of the pixel profile so that opticalefficiency may improve.

In the pixel-profile deformation by the micro lens prepared in theconventional opposite substrate, the image profile of the unrealizableconfiguration is realizable. High-resolution imaging is realizable.

It is the penetrated type micro lens and especially the F value can makethe color yield with the very small big single lens there be nothing inthe case of the mirror.

Also at the point, dispersion by the color of the pixel profile can bereduced greatly, and the high resolution can be conventionally realizednow.

The present invention can improve resolution by decreasing thecross-talk of the contiguity pixels of the liquid crystal itself. Thecross-talk of the image which adjoins by preparing the electrode patternand the shading layer can be easily decreased now, and the image of thehigh resolution can be realized.

In FIG. 18, the concave mirror may not be limited to the sphericalmirror and the aspherical mirror or the sculptured-surface mirror issufficient as it. It is possible to use two or more sheets combining theplane mirror which does not have the curved surface.

By using for the mirror plane which countered the V character typeaslant symmetrically by the two sheets, the level or perpendicular pixelprofile of the either 1 direction can be deformed, and the pixel can bereduced.

When the three or more sheets are used, the pixel can be reduced moreeffectively and it is desirable.

By using the mirror plane of the four sheets which countered in the twodirections aslant like the reverse pyramid configuration, the pixel isreducible in the two horizontal and vertical directions.

By increasing the number of sheets of the mirror plane, the pixel iseffectively reducible.

Since these do not need to form the curved-surface configuration, whenthe number of sheets of the mirror plane is about several sheets, theycan be manufactured comparatively easily using the MEMS technique, andare low costs more.

In FIG. 18, since it is not necessary to form the liquid crystal layer54 in the concave surface configuration by having the embedding layer52, it is not necessary to prepare the convex configuration in theopposite substrate. Location doubling etc. becomes unnecessary and itallows easy attachment.

Since the index of refraction becomes at least 1.3 or more by embeddingthe transparent derivative material, without considering as the airspace and the focal distance f of the concave mirror (absolute value) isgiven by the formula: f=r/(nd) with the curvature r, and the diameter dand the index of refraction n, the focal distance of the concave mirrorcan be made small by 30 percent or more to the air space, even if it isthe same curvature.

Many aberrations, such as the spherical yield on the shaft of theconcave mirror, and the astigmatism besides the shaft, the coma, can begreatly decreased now, and it comes to be able to carry out the highresolution imaging more by reducing the rate of reduction of the pixelgreatly.

In FIG. 18, the flattened layer 53 which becomes the upper part of theembedding layer 52 from another transparent material is formed, andflattening processing of the flattened layer 53 is carried out by thechemical polishing in the upper surface.

It is realizable to have formed the liquid crystal layer and to makethickness of the liquid crystal layer by the the less than 1 micron ofplus or minus, after forming the transference electrode and theorientation film on the flattened layer 53.

The good contrast and homogeneity within the field can be realized, andthe homogeneity within the panel improves.

The flattened layer 53 may unify and embed the embedding layer 52, andthe layer itself may be used for it as a flattened layer.

In impressing the electric field to the liquid crystal, without formingthe transparent electrode 57, the electric field can also be directlyimpressed by the reflector 56, and since the configuration is simple, itexcels in dependability at low cost.

When the curvature of the concave mirror is small, or time pixel pitchis large (the concave surface configuration), the concave-convexdifference of the member 51 becomes large, and the case where theelectric field cannot be uniformly impressed to the liquid crystal layer54 arises.

For the reason, as shown in FIG. 18, the uniform electric field can beimpressed now to the liquid crystal layer within the pixel by formingthe transparent electrode 57 separately on the flattened layer 53.

The contrast of the image can be improved now.

Besides contacting electrically using the through-hole filling member,the transparent electrode 57 and the transparent reflector 56 may makethe embedding layer 52 thin, and may contact the transference electrode57 electrically directly in the edge portion of the reflector 56.

In the composition of the embodiment 14 of FIG. 18, in order to evaluatethe characteristics of the pixel profile quantitatively, the three kindsof evaluation parameter: (1) the CTF (Contrast Transfer Function) and(2) the rate of reduction α(alpha), and (3) the use efficiency η(eta)are used.

FIG. 24A and FIG. 24B are diagrams for explaining the definition of CTF.

The pixel profile is reduced by the pixel reduction unit from theoriginal square, and FIG. 24A is the outline view of the outer diameterconfiguration at the time of deformation.

FIG. 24B is the optical intensity distribution map used as the pixelprofile which is a cross-sectional view of the space horizontaldirection of FIG. 24A.

As shown in FIG. 24A, while the three pixels 91 measured or checked bylooking are not the pixel profile but the continuous pixel profiles ofthe perfect rectangle configuration as shown in FIG. 24B when itactually evaluates quantitatively, they have the minimum values MINother than zero.

In the embodiment, as shown in the formula (11), CTF is defined by usingthe maximum value MAX of the pixel profile and the minimum value MIN ofthe pixel profile.CTF=(MAX−MIN)/(MAX+MIN)  (11)

However, the first waveform is made into the pixel square wave of thereflection-type light valve to the usual MTF being the transfer functionof the sine wave here.

For the reason, since it is CTF at the time of carrying out pixelreduction, the spatial frequency turns into the spatial frequency towhich the inverse of the pitch of the original pixel corresponds as itis.

Since the CTF is the transfer function of the square wave, since CTF isdetermined by the MTF characteristics of the low frequency, they are notthe number of the high frequency, and MTF of the specific spatialfrequency and the thing which corresponds uniquely more except thecorresponding spatial frequency.

It is the same as that of MTF from the viewpoint of the limit ofresolution almost, and 50% or more of value of usual is however, morepreferably good 30% or more preferably at least 20% or more.

If it is 65% or more, as the visibility, it will be recognized almostlike the original square wave.

The measurement of CTF is performed by combining the microscope objectlens and the CCD light-receiving unit through the prism type beamsplitter.

Moreover, using the projection lens with which MTF characteristicsdiffer instead of the microscope object lens, CCD has been directlyarranged to the field which arranges the screen used as the conjugate,and is carried out to it.

The microscope object lens prepared the aperture as occasion demands,and incorporated the 20-fold high resolution as many SLWD of the longworking distance of NIKON as the, and the 40-fold one, and NA iscontrolled and used for it.

Its own thing is used for the projection lens.

The amount of CCD of the dark noise is removed and calculated.

If the ideal optical system is used to the pixel profile of therectangle configuration, the image on which it is projected on thescreen is the rectangle, and can realize the clear image.

Although such an image obtains the good result by subjectivityevaluation, carrying out the deer when image information is the few dataprojector in the conventional display of low resolution

The image quality which the feeling of the “jaggies” and the feeling of“discontinuity of gradation nature” arose by subjectivity evaluation,and is not necessarily excellent in the display of the conventional highresolution beyond twice in the image display apparatus which is going torealize the “smoothness” of the image, or the image display apparatus ofthe image information with the main image display of the video is notnecessarily given.

These are combined also with the rate of reduction described to thecorresponding following as the rate of the aperture, and influence imagequality.

The rate of reduction is the same composition as the optical system bywhich CTF is evaluated, and is evaluated using the full width at halfmaximum.

The rate alpha of reduction is defined by the following formula (12).Picture element size of the full width at half maximum/spatialoptical-modulator of alpha=pixel profile  (12)

However, when the expansion optical system is used, it normalized withthe dilation ratio, and when the rate alpha of reduction is 1.0 or 100%,it could be twice, such as those without reduction.

This rate of reduction is important with CTF as a basis of highreduction of the image.

It turns out that it is in the state of fault reduction where the highprecision image cannot become by the crevices other than the profilebecoming remarkable shortly even if the value is too small conversely,although it is not reduced at all and cannot become the high precisionimaging from the viewpoint of the high precision imaging by pixelreduction when alpha is 1.0.

Then, it is experimented in the relation of the rate of reduction andimage quality at the time of shifting the image using the optical-axisshift unit by subjectivity evaluation.

The rate of reduction influences image quality greatly, when highresolving is formed using the optical-axis shift unit.

The result (embodiment 17) shown in Table 11 about the high reduction ofthe rate of reduction and the image is obtained from subjectiveevaluation of the image based on the profile as shown in FIG. 24A.

Concerning the increase in the number of the pixels described above,they could be the 4-fold high resolution imaging.

The image evaluated the image including the pixel which has the imageprofile from which alpha differs.

TABLE 11 (Embodiment 17) α′ 0.25 0.35 0.4 0.5 0.6 0.7 0.8 1.0 ImageQuality D C B B B B C D

Concerning the rating of image quality in Table 11, B indicates good, Cindicates acceptable, and D indicates non-acceptable. Plural evaluationsof the image (the embodiment 17) for the gradation, the sharpness andthe noise have been given by ten observers based on the five phases ofscaling which is the series criteria method. The result of 4 or morepoints is Rating=B, the result of 3 points is Rating=C, and the resultof 2 or less points is Rating=D.

As shown in Table 11, when α′=1.0, the pixel image is not reduced at alland it is not a high precision image.

Although alpha′ of effectiveness is not remarkable at 0.8, there is thedifference as compared with the time of 1.0.

Therefore, the upper limit of alpha′ is considered to be 0.9 order. Itis preferable that it is less than 0.8 and larger than 0.35. It is morepreferable that it is less than 0.7 and larger than 0.4.

Although alpha′ should be suitably small just only in the high reductionof the image by pixel reduction, when making the number of the pixelsincrease, the rate of reduction must be the value according to the rateof increase.

Like the above-mentioned example, when the number of the pixels isincreased the 4-fold (=2×2) one, 0.5 order is more suitable for alpha′.

However, when the number of the pixels is increased the 9-fold one(=3×3) in the value, it is large.

Since it is the configuration where the profile lengthened the foot, thelap arises between the pixels and CTF is because degradation and thequality of image deteriorate.

When the level which shifts the optical axis by the optical-axis shiftunit is the three pieces [n or more] except two, it is desirable thatthey are 0.8*⅔ times the rate of pixel size reduction of the.

Thereby, the image of the same convolution as the twice as manyoptical-axis shift as the can be acquired.

Also in the 3-fold or 4-fold one as many optical-axis shift as the,degradation of the resolution by the cross talk between the adjoiningpixels can be reduced.

More specifically, it is desirable that in the case of the 3-fold one,it is less than 0.53 and larger than 0.23. It is more desirable that itis less than 0.46 and larger than 0.23.

As for alpha′, about 0.33 is the optimum value.

If the image is dark even if the image is high precision, it does notbecome good image quality, but use efficiency is also important.

As a scale which measures the, the use efficiency η about one pixel isdefined in the following.

The use efficiency η is the ratio of the energy arrived at the rangeequivalent to one pixel on the screen to the energy reflected by onepixel on the light valve.

The definition of the use efficiency η at the time of projecting on thescreen is shown in the following formula (13).η=(energy(W)arrived at the range equivalent to one pixel on thescreen)/(energy reflected by one pixel on the light valve)  (13)

In the case of the ½ pixel reduction (alpha=0.5) where the pixel size issimply reduced using the aperture of the shading layer only, the opticaluse efficiency η is 25%. It is desirable that the range of η is morethan the level at least.

It is required to improve the above-mentioned value of CTF, alpha, and ηappropriately about the high-resolution imaging using the optical-axisshift unit.

The production of the reflection-type light valve of the embodiment 14of the invention will be described in the following.

The transparent derivative layer is formed by the thickness of about 2microns on the aluminium metallic-reflection electrode, using thesilicon-substrate back plain for the usual LCOS as it is.

The film formation method produces the SiO₂ layer, the SiON layer, theSiN layer, etc. by the PCVD, and the Al₂O₃ layer, the TiO₂ layer, theZnO layer, etc. by the EB evaporation coating and the spattering.

Then, after forming the through hole for contact in the edge portion ofthe pixel, it is crowded in the aluminium metal into the portion withelectrocasting.

Moreover, after forming the concave surface configuration resist layerfor transfer with the gradation nature mask, the concave surfaceconfiguration of about 0.5–2.0 microns is formed by dry etching.

Then, after forming the aluminium electrode on the whole surface, inorder to prevent contact between the pixels, etching removes thecircumference portion.

Then, the transparent derivative layer is again formed by the thicknessof the about 2 microns on the aluminium metallic-reflection electrode.

The film formation method produces the SiO₂ layer, the SiON layer, theSiN layer, etc. by the PCVD, and the Al₂O₃ layer, the TiO₂ layer, theZnO layer, etc. by the EB evaporation coating and the spattering.

Then, after forming the 2nd through hole for contact in the edge portionof the pixel, it is crowded in the aluminium metal into the portion withelectrocasting.

Then, after carrying out the chemical polishing and forming the ITOelectrode on the whole surface, in order to prevent contact between thepixels, dry etching removes the circumference portion.

Furthermore, the orientation film of the polyimide is applied on the ITOfilm.

After this, similar to the usual LCOS, the attaching of the substrate tothe opposing substrate, the assembly, the liquid pouring and the sealingare performed.

The reflection-type light valve of-the embodiment 14 of the presentinvention used for and estimated the optical-design evaluation tool bycomposition as shown in FIG. 23 as the CCD camera which has arranged theprojection image to the field expanded under the microscope assubstitution of the screen side to the evaluation of the condition onthe screen.

As an optical-design evaluation tool, the number of the rays of light ismade into about 200,000 using the light-tools (the 3rd edition) of theU.S. optical research association company in which the non-sequentialray-tracing analysis is possible (when a 1-GHz CPU is used and it is thecomputational complexity for about 50 minutes).

In order to reduce the burden of calculation, the ray tracing isperformed only about two or more pixels of, the specific range, andcalculated and evaluated the optical intensity distribution in the largerange in the screen side by carrying out the convolution with thespecial calculation tool.

The value of 150W class DC discharge lamp of Ushio Co. is used for thehigh-pressure mercury lamp.

By the fly eye lens of 5×8, the lighting angle carried out designproduction so that the perpendicular lighting angle might become the7-fold one.

The projection lens installed the aperture equivalent to the thing ofhigh re-solving of F2.4.

Table 12 shows the embodiment 18 and the embodiment 19 of the inventionwith which the evaluation value of the pixel reduction in thecomposition of FIG. 18 has been obtained.

The embodiment 18 uses the index of refraction n=1.83 of the embeddinglayer 2 and the radius of curvature: r=150 microns, while the embodiment19 uses the index of refraction n=1.83 of the embedding layer 2 and theradius of curvature: r=190 microns. The pixel pitch is 14 microns.

TABLE 12 CTF (%) η (%) α (%) Embodiment 18 80.9 74.7 52.8 Embodiment 1980.1 82.8 50.4

Moreover, the example 11 of comparison at the time of using the microlens is shown in Table 13, and the example 12 of comparison is shown inTable 14.

The index of refraction is the index of refraction of the member whichhas the convex configuration.

The members which have the shape of a concave are the photoresistadhesives of the fluorine system.

The index of refraction is n=1.4.

Thickness t is the distance of the heights of the member which have theconvex configuration, and the liquid crystal layer, and contains theaverage thickness of the 4 microns of the photoresist adhesives of thefluorine system.

When it is easy to become uneven with the thickness of the middlesubstrate and priority is given to the homogeneity within the field, asfor thickness t, it is desirable that it is the at least 20 microns ormore. The pixel pitch is 14 microns.

TABLE 13 (Comparative Example 11) micro lens n = 1.63, r = 10 μm t (μm)CTF (%) η (%) α (%) 21 59.4 66.6 79.4 24 40.5 82.8 55.0 33 37.8 74.758.9

TABLE 14 (Comparative Example 12) micro lens n = 1.75, r = 10 μm t (μm)CTF (%) η (%) α (%) 19 79.4 53.1 57.5 22 54.2 64.8 53.4 26 70.0 57.650.3

It turns out that the way at the time of using the mirror can improvesimultaneously at least two or more evaluation values in CTF, η, and α,and can make reduction of the remaining evaluation value the minimum sothat the embodiment 18, the embodiment 19, and the examples 11 and 12 ofcomparison may be compared and may be known.

The embodiment 20 used as the evaluation value of pixel reduction of theembodiment of FIG. 18 at the time of embedding in FIG. 25, whencurvature r is fixed to the 100 microns, and changing the index ofrefraction of the layer to it is shown.

As shown in FIG. 25, the index of refraction of the embedding layer isdesirably a larger one, and if the index of refraction is 1.6 or more,the optical use efficiency becomes 90% or more. That is, it is theoptical loss of 1/10 or less, and a high optical use efficiency can beobtained.

Moreover, with the index of refraction of 1.7 or more, the optical useefficiency becomes about 97% or more, or the fixed use efficiency level.It is more desirable.

Since various transparent derivative materials can form the films orlayers by the PCVD, the EB evaporation coating, the spattering, etc.with the index of refraction of 2.2 or less. If the material with theindex of refraction of 2.2 or less is used, the dry etching will easilybe carried out. The rate of reduction remains almost unchanged as theindex of refraction increase, but the optical use efficiency falls insuch a case. Hence, it is desirable that the index of refraction islarger than 1.7 and less than. 2.2.

As shown in the embodiment 20, the materials with the index ofrefraction of 1.6 or larger are more desirable than the usualtransparent materials with the index of refraction of less than 1.6 andlarger than 1.4; that is, SiO₂, BK7 and acrylic polymer, the “saitoppu”,and the 1737 glass (Corning Co.). The focal distance f of the concavemirror (absolute value) is given by the formula f=r/(nd) where theradius of curvature r, the diameter d, and the index of refraction n, asmentioned above.

FIG. 26 shows the rate of reduction which is the evaluation value of thepixel reduction in the embodiment 21 of the invention when changing thecurvature of the concave mirror. FIG. 27 shows the CTF which is theevaluation value of the pixel reduction in the embodiment 21 of theinvention when changing the curvature of the concave mirror.

In the embodiment 21, the embedding layer has the index of refractionn=1.6, and the pixel pitch is 14 microns.

As shown in FIG. 26, as for the rate of reduction, it is desirable thatthe radius of curvature is larger than 30 microns and smaller than 250microns. It is more desirable that the radius of curvature is largerthan 50 microns and smaller than 200 microns.

As shown in FIG. 27, like FIG. 26, the CTF changes rapidly and it isdesirable that the radius of curvature is larger than 30 microns andsmaller than 250 microns. It is more desirable that the radius ofcurvature is larger than 50 microns and smaller than 200 microns.

In this embodiment, the rate of reduction is larger than 40% and smallerthan 50%. It is not a faulty reduction that degrades the image quality.

The pixel profile is not the rectangle configuration, and it is possibleto secure a CTF in the range of 50% or more.

Thus, by using the optical-axis shift unit to the reduced pixel whichdeformed the pixel profile, the image display apparatus which realizesthe very high-definition image which can realize the resolution and thesmoothness of the image simultaneously is realizable.

The pixel pitch in the embodiment 21 is 14 microns. In the embodiment21, the beam profile deformation unit is configured as an opticalelement including a concave mirror plane having a curved surface, andconfigured to meet the formula: 2.2/(m/2)<r/d<17.9/(m/2) where mindicates the number of modulation steps of the light-path modulationunit, d is a diameter of the concave mirror plane having the curvedsurface, and r is an average radius of curvature of the concave mirrorplane.

Moreover, in the embodiment 21, the embedding layer having the index ofrefraction of 1.6 or more is taken into consideration. The beam profiledeformation unit in this embodiment is configured as an optical elementincluding a concave mirror plane having a curved surface, and configuredto meet the formula: 1.1/(m/2)<n×Fr<8.91/(m/2) where Fr indicates an Fvalue of the concave mirror plane, m indicates the number of modulationsteps of the light-path modulation unit, and n is an index of refractionof the embedding layer of the beam profile deformation unit.

Furthermore, in the embodiment 21, the Fi value being 4 is considered.The beam profile deformation unit in this embodiment is configured as anoptical element including a concave mirror plane having a curvedsurface, and configured to meet the formula:0.27/(m/2)<n×(Fr/Fi)<2.2/(m/2) where Fr indicates an F value of theconcave mirror plane, Fi indicates an F value of the irradiation beamincident to the optical modulators, m indicates the number of modulationsteps of the light-path modulation unit, and n is an index of refractionof the embedding layer of the beam profile deformation unit.

FIG. 28 shows the embodiment 22 of the image display apparatus of thepresent invention when the micro lens and the mirror plane are united.

In FIG. 28, reference numeral 151 is the back plain having the uppersurface reflector, 152 is the micro lens, 153 is the flattened layer,154 is the liquid crystal layer, and 155 is the opposite substrate.

Although illustration has not been carried out, the ITO electrode, thecontact hole, etc. whose liquid crystal layer is included as in FIG. 18are formed.

In this embodiment, the almost same pixel profile as FIG. 18 can bedeformed by the micro lens being united with the reflector, and beingarranged the light source side to the liquid crystal layer at theopposite side.

Simultaneously, since the mirror can be constituted from the flatsurface, production becomes easier, yield's can improve and can consideras low cost.

The configuration of the micro lens serves twice simultaneous in thesame part, and the curvature may be small. The production processbecomes easy, and the yield also becomes small.

Besides embedding and carrying out the flattening of the micro lens ofthe convex configuration with the high index of refraction with thematerial of the low index of refraction, it is possible to embed andform the micro lens of the shape of a concave of the low index ofrefraction with the material of the high index of refraction.

FIG. 29 shows the embodiment 23 of the image display apparatus of thepresent invention when the micro lens and the mirror plane are united.

In FIG. 29, reference numeral 151 is the back plain having the uppersurface reflector, 161 is the micro lens lower layer, 162 is the microlens, 153 is the flattened layer, 154 is the liquid crystal layer, and155 is the opposite substrate.

Although illustration has not been carried out, the ITO electrode, thecontact hole, etc. whose liquid crystal layer is included as in FIG. 18are formed.

In the embodiment, the micro lens is the same as that of the case wherethe reflector and the micro lens are united like FIG. 28, by being inthe opposite side of the liquid crystal layer as an optical action,although separated by the concave surface configuration material and thelower layer 161.

In the case, since the number of the fields of the lens can beincreased, the yield of the lens can be reduced more and the imagedisplay of the high resolution can be performed by controlling the pixelprofile more.

Moreover, by making thickness of the lens thin, the absolute value ofdispersion in the thickness of the flattened layer in the case of thepolish produced by the stress corresponding to the concavo-convexconfiguration can also be decreased, the gap is more uniform and theimage display apparatus with little dispersion within the field with thehigh contrast can be offered.

FIG. 30 shows the embodiment 24 of the image display apparatus of thepresent invention when the micro prism and the mirror plane are united.

In FIG. 30, reference numeral 151 is the back plain having the uppersurface reflector, 171 is the micro prism, 153 is the flattened layer,154 is the liquid crystal layer, and 155 is the opposite substrate.

Although illustration has not been carried out, the ITO electrode, thecontact hole, etc. whose liquid crystal layer is included as in FIG. 18are formed.

In the embodiment, the almost same pixel profile as FIG. 18 can bedeformed by the micro prism being united with the reflector, and beingarranged the light source side to the liquid crystal layer as in FIG.28, at the opposite side.

Simultaneously, since the mirror and the prism can be constituted fromthe flat surface, production becomes easier, yield's can improve and canconsider as low cost.

FIG. 31 shows the embodiment 25 of the image display apparatus of thepresent invention when the modulation layer and the concave mirror planeare united.

In FIG. 31, reference numeral 181 is the back plain having the SRAM, 182is the hinge pillar, 183 a and 183 b are the concave mirror movableparts, and 184 a and 184 b are the flattened layers of the concavemirror.

In this embodiment, the movable parts 183 a and 183 b are the modulationlayers which are produced with the MEMS technique and perform theoptical modulation by the deviation control. They are a reflection-typeelement which performs the digital modulation of zero and one for thereflection light with the two states: the state of the parts 183 a and184 a and the state of the parts 183 b and 184 b.

In this embodiment, while the almost same pixel profile as FIG. 18 canbe deformed by forming the concave mirror configuration in the portionused as the movable mirror, since the pixel reduction in the impossibledeviated type optical modulator is realizable, the high contrast of thedeviated type optical modulator is realizable with the conventionalmicro-lens opposite substrate.

The restriction of the pixel pitch which has the limitation according tothe MEMS configuration can be simultaneously solved by optical-axisshift, and the image display apparatus of the high resolution can berealized.

Since the flattened layer can make the focal distance of the concavemirror small, it is effective for the image display apparatus.

Besides the concave mirror configuration, it is possible to constitutethe micro lens on the plane mirror.

FIG. 32 shows the embodiment 26 of the image display apparatus of thepresent invention at the time of using the shading layer for the spatialoptical modulator.

In FIG. 32, reference numeral 151 is the back plain having the uppersurface reflector, 152 is the micro lens, 153 is the flattened layer,154 is the liquid crystal layer, 155 is the opposite substrate, and 191a–191 d are the black matrix layers prepared around the concave mirrorin the shape of a lattice.

Although illustration has not been carried out, the ITO electrode, thecontact hole, etc. whose liquid crystal layer is included as in FIG. 18are formed.

In this embodiment, by masking the large portion of the yield of theconcave mirror at the same time it can reduce the scattered light nearthe edge of the concave mirror and improves the contrast, the blackmatrix layers 91 a–91 d can reduce the pixel size more, and the imagedisplay apparatus of this embodiment can provide higher resolutionimaging.

The reflection-type light valve of FIG. 18 is not limited to theabove-described embodiments, and it is applicable to a space type lightexchange switch for optical communications. Alternatively, it isapplicable to an optical-information-processing circuit device bycombining the flat-surface type light-receiving unit, the operationalcircuit, the flat-surface type light emitting element, the micro-lensmulti-stage array, etc.

The present invention is not limited to the above-described embodiments,and variations and modifications may be made without departing from thescope of the present invention.

Further, the present invention is based on Japanese priority applicationNo. 2002-049840, filed on Feb. 26, 2002, and Japanese priorityapplication No. 2002-048010, filed on Feb. 25, 2002, the entire contentsof which are hereby incorporated by reference.

1. A projection image display apparatus comprising: an indicatingelement configured to modulate or emit light as a pixel in accordancewith image information; a pixel-profile deformation unit configured todeform an optical intensity profile of the pixel; a displacement unitconfigured to optically displace a position of the pixel, the opticalintensity profile of the pixel being deformed by the pixel-profiledeformation unit, for each of two or more sub-fields constituting animage field corresponding to the image information; and a projectionunit configured to enlarge the pixel, the optical intensity profile ofthe pixel being deformed by the pixel-profile deformation unit, and toproject an enlarged pixel on a screen.
 2. The projection image displayapparatus of claim 1, wherein the pixel-profile deformation unit isfurther configured to deform the optical intensity profile of the pixelinto a pixel profile of a non-rectangle configuration.
 3. The projectionimage display apparatus of claim 2, wherein the pixel of the pixelprofile produced by the pixel-profile deformation unit has a concaveportion near a center of the pixel.
 4. The projection image displayapparatus of claim 1, wherein the pixel-profile deformation unit deformsthe optical intensity profile so as to meet the formula: w<=0.7p×(2/n),where w is a full width at half maximum of the resulting pixel profile,p is a pixel pitch, and n is an integer above 2 and indicates the numberof steps in which displacement is carried out by the displacement unit.5. The projection image display apparatus of claim 1, wherein thepixel-profile deformation unit deforms the optical intensity profile soas to meet the formula: 0.5p ×(2/n)<w<=0.7p ×(2/n), where w is a fullwidth at half maximum of the resulting pixel profile, p is a pixelpitch, and n is an integer above 2 and indicates the number of steps inwhich displacement is carried out by the displacement unit.
 6. Theprojection image display apparatus of claim 1, wherein the pixel-profiledeformation unit deforms the optical intensity profile so that a minimumoptical intensity of a continuation pixel profile produced from two ormore continuous pixel profiles produced by the pixel-profile deformationunit is less than 43% of a maximum optical intensity of the continuationpixel profile.
 7. The projection image display apparatus of claim 1,wherein the pixel-profile deformation unit deforms the optical intensityprofile so as to meet the formula: w <=0.7p ×(2/n), where w is a fullwidth at half maximum of the resulting pixel profile, p is a pixelpitch, and n is an integer above 2 and indicates the number of steps inwhich displacement is carried out by the displacement unit, and whereinthe pixel-profile deformation unit deforms the optical intensity profileso that a minimum optical intensity of a continuation pixel profileproduced from two or more continuous pixel profiles produced by thepixel-profile deformation unit is less than 33% of a maximum opticalintensity of the continuation pixel profile.
 8. The projection imagedisplay apparatus of claim 2, wherein the pixel-profile deformation unitdeforms the optical intensity profile so as to meet the formula:w<=0.6p×(2/n), where w is a full width at half maximum of the resultingpixel profile, p is a pixel pitch, and n is an integer above 2 andindicates the number of steps in which displacement is carried out bythe displacement unit.
 9. The projection image display apparatus ofclaim 1, wherein the pixel-profile deformation unit deforms the opticalintensity profile so as to meet the formula: W<=0.7P ×(2/n), where W isa full width at half maximum of a projection pixel profile of theenlarged pixel produced for each sub-field by the projection unit fromthe pixel of the resulting pixel profile, P is a pitch of the enlargedpixel, and n is an integer above 2 and indicates the number of steps inwhich displacement is carried out by the displacement unit.
 10. Theprojection image display apparatus of claim 1, wherein the pixel-profiledeformation unit deforms the optical intensity profile so as to meet theformula: 0.5P ×(2/n)<W<=0.7P×(2/n), where W is a full width at halfmaximum of a projection pixel profile of the enlarged pixel produced foreach sub-field by the projection unit from the pixel of the resultingpixel profile, P is a pitch of the enlarged pixel, and n is an integerabove 2 and indicates the number of steps in which displacement iscarried out by the displacement unit.
 11. The projection image displayapparatus of claim 1, wherein the pixel-profile deformation unit deformsthe optical intensity profile so that a minimum optical intensity of acontinuation pixel profile, which is produced from two or morecontinuous pixel profiles produced by the pixel-profile deformation unitbased on two or more continuous pixels projected by the projection unit,is less than 43% of a maximum optical intensity of the continuationpixel profile.
 12. The projection image display apparatus of claim 1,wherein the pixel-profile deformation unit deforms the optical intensityprofile so as to meet the formula: W<=0.7P ×(2/n), where W is a fullwidth at half maximum of a projection pixel profile of the enlargedpixel produced for each sub-field by the projection unit from the pixelof the resulting pixel profile, P is a pitch of the enlarged pixel, andn is an integer above 2 and indicates the number of steps in whichdisplacement is carried out by the displacement unit, and wherein thepixel-profile deformation unit deforms the optical intensity profile sothat a minimum optical intensity of a continuation pixel profileproduced from two or more continuous pixel profiles produced by thepixel-profile deformation unit is less than 33% of a maximum opticalintensity of the continuation pixel profile.
 13. The projection imagedisplay apparatus of claim 1, wherein the pixel-profile deformation unitdeforms the optical intensity profile so as to meet the formula: W<=0.7P×(2/n), where W is a full width at half maximum of a projection pixelprofile of the enlarged pixel produced for each sub-field by theprojection unit from the pixel of the resulting pixel profile, P is apitch of the enlarged pixel, and n is an integer above 2 and indicatesthe number of steps in which displacement is carried out by thedisplacement unit, and wherein the pixel-profile deformation unitdeforms the optical intensity profile of the pixel into a pixel profileof a non-rectangle configuration, and the pixel of the pixel profileproduced by the pixel-profile deformation unit has a concave portionnear a center of the pixel.
 14. The projection image display apparatusof claim 1, wherein the pixel-profile deformation unit includes amicro-lens array which is formed with a curved surface.
 15. Theprojection image display apparatus of claim 1, wherein the pixel-profiledeformation unit includes a gradient-index lens array in which arefractive index is distributed therein.
 16. The projection imagedisplay apparatus of claim 1, wherein the pixel-profile deformation unitincludes a concave surface mirror array having a concave surface mirror.17. The projection image display apparatus of claim 1, wherein thepixel-profile deformation unit includes an aperture array having an areasmaller than an area of the original pixel.
 18. An image displayapparatus comprising: a light source configured to emit light; anirradiation optical element configured to convert the light from thelight source into an irradiation beam; a plurality of opticalmodulators, each optical modulator configured to modulate theirradiation beam in accordance with image information and each opticalmodulator is configured to output a reflected beam; a reflection-typebeam profile deformation unit, provided in each of the plurality ofoptical modulators, configured to deform a beam profile of the reflectedbeam output from each optical modulator; and a light path modulationunit configured to optically displace a position of the reflected beam,the optical intensity profile of the reflected beam being deformed bythe reflection-type beam profile deformation unit.
 19. The image displayapparatus of claim 18, wherein the beam profile deformation unitcomprises an optical element which includes a mirror plane having aconcave portion.
 20. The image display apparatus of claim 18, whereinthe beam profile deformation unit comprises an optical element whichincludes a concave mirror plane having a curved surface.
 21. The imagedisplay apparatus of claim 19, wherein the beam profile deformation unitincludes an embedding member at each of an incident side and an outgoingside of the mirror plane, and the embedding member being made of atransparent material having an index of refraction that is equal to orlarger than 1.6.
 22. The image display apparatus of claim 18, whereinthe beam profile deformation unit comprises an optical element whichincludes a concave mirror plane having a curved surface, and wherein thebeam profile deformation unit is configured to meet the formula:2.2/(m/2)<r/d<17.9/(m/2), where m indicates the number of modulationsteps of the light-path modulation unit, d is a diameter of the concavemirror plane having the curved surface, and r is an average radius ofcurvature of the concave mirror plane.
 23. The image display apparatusof claim 18, wherein the beam profile deformation unit comprises anoptical element which includes a concave mirror plane having a curvedsurface, and wherein the beam profile deformation unit is configured tomeet the formula: 1.1/(m/2)<n×Fr<8.9/(m/2), where Fr indicates an Fvalue of the concave mirror plane, m indicates the number of modulationsteps of the light-path modulation unit, and n is an index of refractionof an embedding member of the beam profile deformation unit.
 24. Theimage display apparatus of claim 18, wherein the beam profiledeformation unit comprises an optical element which includes a concavemirror plane having a curved surface, and wherein the beam profiledeformation unit is configured to meet the formula: 0.27/(m/2)<n×(Fr/Fi)<2.2/(m/2), where Fr indicates an F value of the concave mirrorplane, Fi indicates an F value of the irradiation beam incident to theoptical modulators, m indicates the number of modulation steps of thelight-path modulation unit, and n is an index of refraction of anembedding member of the beam profile deformation unit.
 25. The imagedisplay apparatus of claim 18, wherein the beam profile deformation unitcomprises an optical element which is formed integrally with both amirror plane and a micro lens.
 26. The image display apparatus of claim25, wherein the micro lens comprises a curved surface.
 27. The imagedisplay apparatus of claim 25, wherein the micro lens comprises agradient-index lens array.
 28. The image display apparatus of claim 18,wherein the beam profile deformation unit comprises an optical elementwhich is formed integrally with both a mirror plane and a micro prism.29. The image display apparatus of 28, wherein the micro prism of thebeam profile deformation unit includes a diffraction grating.
 30. Theimage display apparatus of claim 18, wherein the plurality of opticalmodulators include an optical-modulation layer which modulates light bya permeability change or a deviation angle change, and the beam profiledeformation unit is provided over a surface of the optical-modulationlayer opposite to the irradiation beam in a direction of incidence. 31.The image display apparatus of claim 30, further comprising a flattenedlayer provided between the beam profile deformation unit and theoptical-modulation layer.
 32. The image display apparatus of claim 31,further comprising an electric conduction layer between the flattenedlayer and the optical-modulation layer.
 33. The image display apparatusof claim 18, wherein the plurality of optical modulators include anoptical-modulation layer which modulates light by a permeability changeor a deviation angle change, and the beam profile deformation unit isformed integrally with the optical-modulation layer.
 34. The imagedisplay apparatus of claim 18, wherein the plurality of opticalmodulators include a shading layer having an aperture.
 35. The imagedisplay apparatus of claim 18, wherein a full width at half maximum ofthe beam profile of the reflected beam from each optical modulator issmaller than a pitch of the optical modulators, and an imaging lens isprovided to perform imaging of the reflected beam at a locationdifferent from a location of an optical-modulation layer of the opticalmodulators.
 36. The image display apparatus of claim 18, wherein a fullwidth at half maximum of the beam profile of the reflected beam fromeach optical modulator is smaller than a pitch of the opticalmodulators, and a virtual image forming lens is provided to performvirtual imaging of the reflected beam at a location different from alocation of an optical-modulation layer of the optical modulators.